Transparent rutile TiO2 films prepared by thermal oxidation of sputtered Ti on FTO glass

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F19%3A00503932" target="_blank" >RIV/61388955:_____/19:00503932 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68378271:_____/19:00503932 RIV/60461373:22310/19:43918608

Výsledek na webu

<a href="http://hdl.handle.net/11104/0295698" target="_blank" >http://hdl.handle.net/11104/0295698</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1039/C8PP00313K" target="_blank" >10.1039/C8PP00313K</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Transparent rutile TiO2 films prepared by thermal oxidation of sputtered Ti on FTO glass

Popis výsledku v původním jazyce

TiO2 films were prepared via a two-step fabrication process, i.e. deposition of Ti films by magnetron sputtering on an FTO glass substrate followed by thermal oxidation at 600–725 °C. The investigated parameters were Ti layer thickness, temperature of oxidation and deposition conditions (pre-treatment and substrate heating). Such TiO2 films have a rutile structure and contain metallic Sn which is the result of a thermal reaction at the interface between SnO2 and Ti at temperatures above 500 °C. A calcination temperature of 600 °C is optimal for fabricating TiO2 films with significant photoelectrochemical response. Heating of the FTO substrate during magnetron sputtering deposition of Ti films results in a significant improvement of the compactness of the TiO2 films. A similar but not so pronounced improvement was observed for the TiO2 films deposited on the FTO substrate pre-treated with radio-frequency plasma under Ar–O2 and N2–H2 atmosphere. The observed correlation between the increased content of Sn in the TiO2 films and compactness of the TiO2 films supports the explanation of both positive effects by better adhesion of the Ti films to the FTO substrate.n

Název v anglickém jazyce

Transparent rutile TiO2 films prepared by thermal oxidation of sputtered Ti on FTO glass

Popis výsledku anglicky

TiO2 films were prepared via a two-step fabrication process, i.e. deposition of Ti films by magnetron sputtering on an FTO glass substrate followed by thermal oxidation at 600–725 °C. The investigated parameters were Ti layer thickness, temperature of oxidation and deposition conditions (pre-treatment and substrate heating). Such TiO2 films have a rutile structure and contain metallic Sn which is the result of a thermal reaction at the interface between SnO2 and Ti at temperatures above 500 °C. A calcination temperature of 600 °C is optimal for fabricating TiO2 films with significant photoelectrochemical response. Heating of the FTO substrate during magnetron sputtering deposition of Ti films results in a significant improvement of the compactness of the TiO2 films. A similar but not so pronounced improvement was observed for the TiO2 films deposited on the FTO substrate pre-treated with radio-frequency plasma under Ar–O2 and N2–H2 atmosphere. The observed correlation between the increased content of Sn in the TiO2 films and compactness of the TiO2 films supports the explanation of both positive effects by better adhesion of the Ti films to the FTO substrate.n

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10405 - Electrochemistry (dry cells, batteries, fuel cells, corrosion metals, electrolysis)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2019

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Photochemical & Photobiological Sciences

ISSN

1474-905X

e-ISSN

—

Svazek periodika

18

Číslo periodika v rámci svazku

4

Stát vydavatele periodika

FR - Francouzská republika

Počet stran výsledku

6

Strana od-do

891-896

Kód UT WoS článku

000464060500007

EID výsledku v databázi Scopus

2-s2.0-85064246775