Photoinduced Resist-free Imprinting (PRI) in fullerene thin films as revealed by Grazing Incidence Small-angle X-ray scattering

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F21%3A00541681" target="_blank" >RIV/61388955:_____/21:00541681 - isvavai.cz</a>

Výsledek na webu

<a href="http://hdl.handle.net/11104/0319212" target="_blank" >http://hdl.handle.net/11104/0319212</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.apsusc.2021.149254" target="_blank" >10.1016/j.apsusc.2021.149254</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Photoinduced Resist-free Imprinting (PRI) in fullerene thin films as revealed by Grazing Incidence Small-angle X-ray scattering

Popis výsledku v původním jazyce

In this article we explore the potential of synchrotron Grazing Incidence Small Angle X-ray Scattering (GISAXS) to evaluate the extension of a Photoinduced Resist-free Imprinting (PRI) effect for grating-like Laser Induced Periodic Surface Structures (LIPSS) on spin-coated thin films of the fullerene derivative [6,6]-phenyl C-71-butyric acid methyl ester (PC71BM). Valuable information about the nature of both the original fullerene LIPSS and of the remaining resist-free nanostructure in terms of geometry, size distribution, lattice periodicity and degree of order can be achieved by simulations of the GISAXS patterns. One of the most interesting features provided by the GISAXS analysis is the estimation of the paracrystalline distortion factor, which can be useful to evaluate the level of order in the nanostructure. Data revealed that LIPSS in PC71BM films can be described as onedimensional paracrystalline lattices with levels of order in accordance with those typically observed in LIPSS of other materials. The PRI effect leaves a qualitatively similar nanostructure but about two times more disordered than the original LIPSS one. Our results show that GISAXS is a powerful tool to characterize Resist-free Imprinting procedures of potential relevance in nanotechnology.

Název v anglickém jazyce

Photoinduced Resist-free Imprinting (PRI) in fullerene thin films as revealed by Grazing Incidence Small-angle X-ray scattering

Popis výsledku anglicky

In this article we explore the potential of synchrotron Grazing Incidence Small Angle X-ray Scattering (GISAXS) to evaluate the extension of a Photoinduced Resist-free Imprinting (PRI) effect for grating-like Laser Induced Periodic Surface Structures (LIPSS) on spin-coated thin films of the fullerene derivative [6,6]-phenyl C-71-butyric acid methyl ester (PC71BM). Valuable information about the nature of both the original fullerene LIPSS and of the remaining resist-free nanostructure in terms of geometry, size distribution, lattice periodicity and degree of order can be achieved by simulations of the GISAXS patterns. One of the most interesting features provided by the GISAXS analysis is the estimation of the paracrystalline distortion factor, which can be useful to evaluate the level of order in the nanostructure. Data revealed that LIPSS in PC71BM films can be described as onedimensional paracrystalline lattices with levels of order in accordance with those typically observed in LIPSS of other materials. The PRI effect leaves a qualitatively similar nanostructure but about two times more disordered than the original LIPSS one. Our results show that GISAXS is a powerful tool to characterize Resist-free Imprinting procedures of potential relevance in nanotechnology.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10403 - Physical chemistry

Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Applied Surface Science

ISSN

0169-4332

e-ISSN

1873-5584

Svazek periodika

548

Číslo periodika v rámci svazku

MAY 2021

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

9

Strana od-do

149254

Kód UT WoS článku

000624474700005

EID výsledku v databázi Scopus

2-s2.0-85101331505