Ion beam processing of DNA origami nanostructures

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61388955%3A_____%2F24%3A00583946" target="_blank" >RIV/61388955:_____/24:00583946 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/68378050:_____/24:00583946

Výsledek na webu

<a href="https://hdl.handle.net/11104/0351928" target="_blank" >https://hdl.handle.net/11104/0351928</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.3762/bjnano.15.20" target="_blank" >10.3762/bjnano.15.20</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Ion beam processing of DNA origami nanostructures

Popis výsledku v původním jazyce

DNA origami nanostructures are emerging as a bottomup nanopatterning approach. Direct combination of this approach with topdown nanotechnology, such as ion beams, has not been considered because of the soft nature of the DNA material. Here we demonstrate that the shape of 2D DNA origami nanostructures deposited on Si substrates is well preserved upon irradiation by ion beams, modeling ion implantation, lithography, and sputtering conditions. Structural changes in 2D DNA origami nanostructures deposited on Si are analyzed using AFM imaging. The observed effects on DNA origami include structure height decrease or increase upon fast heavy ion irradiation in vacuum and in air, respectively. Slow- and mediumenergy heavy ion irradiation results in the cutting of the nanostructures or crater formation with ioninduced damage in the 10 nm range around the primary ion track. In all these cases, the designed shape of the 2D origami nanostructure remains unperturbed. Present stability and nature of damages on DNA origami nanostructures enable fusion of DNA origami advantages such as shape and positioning control into novel ion beam nanofabrication approaches.

Název v anglickém jazyce

Ion beam processing of DNA origami nanostructures

Popis výsledku anglicky

DNA origami nanostructures are emerging as a bottomup nanopatterning approach. Direct combination of this approach with topdown nanotechnology, such as ion beams, has not been considered because of the soft nature of the DNA material. Here we demonstrate that the shape of 2D DNA origami nanostructures deposited on Si substrates is well preserved upon irradiation by ion beams, modeling ion implantation, lithography, and sputtering conditions. Structural changes in 2D DNA origami nanostructures deposited on Si are analyzed using AFM imaging. The observed effects on DNA origami include structure height decrease or increase upon fast heavy ion irradiation in vacuum and in air, respectively. Slow- and mediumenergy heavy ion irradiation results in the cutting of the nanostructures or crater formation with ioninduced damage in the 10 nm range around the primary ion track. In all these cases, the designed shape of the 2D origami nanostructure remains unperturbed. Present stability and nature of damages on DNA origami nanostructures enable fusion of DNA origami advantages such as shape and positioning control into novel ion beam nanofabrication approaches.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10403 - Physical chemistry

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2024

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Beilstein Journal of Nanotechnology

ISSN

2190-4286

e-ISSN

2190-4286

Svazek periodika

15

Číslo periodika v rámci svazku

FEB 2024

Stát vydavatele periodika

DE - Spolková republika Německo

Počet stran výsledku

8

Strana od-do

207-214

Kód UT WoS článku

001165319700001

EID výsledku v databázi Scopus

2-s2.0-85191659473