Carboranedithiols: Building Blocks for Self-Assembled Monolayers on Copper Surfaces

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389005%3A_____%2F12%3A00382471" target="_blank" >RIV/61389005:_____/12:00382471 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/61388980:_____/12:00382471 RIV/67985882:_____/12:00382471 RIV/61388955:_____/12:00382471

Výsledek na webu

<a href="http://dx.doi.org/10.1021/la302334x" target="_blank" >http://dx.doi.org/10.1021/la302334x</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1021/la302334x" target="_blank" >10.1021/la302334x</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Carboranedithiols: Building Blocks for Self-Assembled Monolayers on Copper Surfaces

Popis výsledku v původním jazyce

Two different positional isomers of 1,2-dicarba-closo-dodecaboranedithiols, 1,2-(HS)(2)-1,2-C2B10H10 (1) and 9,12-(HS)2-1,2-C2B10H10 (2), have been investigated as cluster building blocks for self-assembled monolayers (SAMs) on copper surfaces. These twoisomers represent a convenient system in which the attachment of SH groups at different positions on the skeleton affects their acidic character and thus also determines their reactivity with a copper surface. Isomer 1 exhibited etching of polycrystalline Cu films, and a detailed investigation of the experimental conditions showed that both the acidic character of SH groups and the presence of oxygen at the copper surface play crucial roles in how the surface reaction proceeds: whether toward a self-assembled monolayer or toward copper film etching. We found that each positional isomer requires completely different conditions for the preparation of a SAM on copper surfaces Both isomers exhibited high capacity to remove oxygen atoms fro

Název v anglickém jazyce

Carboranedithiols: Building Blocks for Self-Assembled Monolayers on Copper Surfaces

Popis výsledku anglicky

Two different positional isomers of 1,2-dicarba-closo-dodecaboranedithiols, 1,2-(HS)(2)-1,2-C2B10H10 (1) and 9,12-(HS)2-1,2-C2B10H10 (2), have been investigated as cluster building blocks for self-assembled monolayers (SAMs) on copper surfaces. These twoisomers represent a convenient system in which the attachment of SH groups at different positions on the skeleton affects their acidic character and thus also determines their reactivity with a copper surface. Isomer 1 exhibited etching of polycrystalline Cu films, and a detailed investigation of the experimental conditions showed that both the acidic character of SH groups and the presence of oxygen at the copper surface play crucial roles in how the surface reaction proceeds: whether toward a self-assembled monolayer or toward copper film etching. We found that each positional isomer requires completely different conditions for the preparation of a SAM on copper surfaces Both isomers exhibited high capacity to remove oxygen atoms fro

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

CA - Anorganická chemie

OECD FORD obor

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Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2012

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Langmuir

ISSN

0743-7463

e-ISSN

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Svazek periodika

28

Číslo periodika v rámci svazku

34

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

9

Strana od-do

12518-12526

Kód UT WoS článku

000307988700013

EID výsledku v databázi Scopus

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