Effect of substrate bias voltage on the composition, microstructure and mechanical properties of W-B-C coatings

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389005%3A_____%2F20%3A00534048" target="_blank" >RIV/61389005:_____/20:00534048 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/00216224:14310/20:00114244

Výsledek na webu

<a href="https://doi.org/10.1016/j.apsusc.2020.146966" target="_blank" >https://doi.org/10.1016/j.apsusc.2020.146966</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.apsusc.2020.146966" target="_blank" >10.1016/j.apsusc.2020.146966</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Effect of substrate bias voltage on the composition, microstructure and mechanical properties of W-B-C coatings

Popis výsledku v původním jazyce

Commercial ceramic protective coatings usually exhibit high hardness, but low ductility impairs their performance and application-oriented properties. Accordingly, a state-of-the-art magnetron sputtered W-B-C coating can be a promising coating for the tooling industry due to its hard yet tough characteristics. In the present study, we have employed substrate biasing to enhance the delivered energy to the growing film and have investigated the effect of bias voltage on the structural and mechanical behavior of W-B-C coatings. The investigations revealed that increasing the substrate bias voltage enhanced the re-sputtering of B and C atoms and subsequently varied the chemical composition of the coatings and significantly decreased the growth rate. It also enhanced the crystallinity of the coatings. We demonstrate how the bias voltage led to an unusual transition from a featureless to a columnar microstructure. Furthermore, it was observed that as the substrate bias voltage increased from 0 V to - 125 V, the compositional and structural changes resulted in a slight decrease of the hardness, while a further increase in the bias voltage to - 200 V enhanced the hardness. This increase was attributed to the suppression of dislocation movement and grain boundary deformation processes by solute segregation and by lattice defects.

Název v anglickém jazyce

Effect of substrate bias voltage on the composition, microstructure and mechanical properties of W-B-C coatings

Popis výsledku anglicky

Commercial ceramic protective coatings usually exhibit high hardness, but low ductility impairs their performance and application-oriented properties. Accordingly, a state-of-the-art magnetron sputtered W-B-C coating can be a promising coating for the tooling industry due to its hard yet tough characteristics. In the present study, we have employed substrate biasing to enhance the delivered energy to the growing film and have investigated the effect of bias voltage on the structural and mechanical behavior of W-B-C coatings. The investigations revealed that increasing the substrate bias voltage enhanced the re-sputtering of B and C atoms and subsequently varied the chemical composition of the coatings and significantly decreased the growth rate. It also enhanced the crystallinity of the coatings. We demonstrate how the bias voltage led to an unusual transition from a featureless to a columnar microstructure. Furthermore, it was observed that as the substrate bias voltage increased from 0 V to - 125 V, the compositional and structural changes resulted in a slight decrease of the hardness, while a further increase in the bias voltage to - 200 V enhanced the hardness. This increase was attributed to the suppression of dislocation movement and grain boundary deformation processes by solute segregation and by lattice defects.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10304 - Nuclear physics

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2020

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Applied Surface Science

ISSN

0169-4332

e-ISSN

—

Svazek periodika

528

Číslo periodika v rámci svazku

OCT

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

9

Strana od-do

146966

Kód UT WoS článku

000576738900007

EID výsledku v databázi Scopus

2-s2.0-85086829843