Laser ablation for material processing
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389005%3A_____%2F22%3A00556901" target="_blank" >RIV/61389005:_____/22:00556901 - isvavai.cz</a>
Nalezeny alternativní kódy
RIV/44555601:13440/22:43897493
Výsledek na webu
<a href="https://doi.org/10.1080/10420150.2022.2049783" target="_blank" >https://doi.org/10.1080/10420150.2022.2049783</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1080/10420150.2022.2049783" target="_blank" >10.1080/10420150.2022.2049783</a>
Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Laser ablation for material processing
Popis výsledku v původním jazyce
The laser ablation is an established material processing for many applications in nanotechnology, materials science and biomedicine. The laser ablation can be carried out in vacuum, in air and in liquid. Laser ablation mechanisms and their products depend on laser fluence, wavelength, pulse duration, ablation environment as well as target composition, density, thickness, roughness. This contribution is addressed to laser ablation of solid targets with the aim of hot plasma generation and thin film deposition on substrates located in appropriate positions in vacuum and in air. In the first section is presented an example of forward and backward plasma accelerations using the sub-nanosecond laser at the PALS laboratory (Czech Republic) for pulsed laser deposition processing. In the second section is reported the use of a nanosecond laser coupled to a post-accelerating compact system employed at the INFN in Catania (Italy) to ablate germanium solid targets in vacuum and to deposit thin films on SiO2/Si substrates to modify their native features. The last section is focused on the use of the nanosecond laser at the Tandetron laboratory (Czech Republic) employed for pulsed laser deposition and laser-induced backward transfer processing in vacuum and in air.
Název v anglickém jazyce
Laser ablation for material processing
Popis výsledku anglicky
The laser ablation is an established material processing for many applications in nanotechnology, materials science and biomedicine. The laser ablation can be carried out in vacuum, in air and in liquid. Laser ablation mechanisms and their products depend on laser fluence, wavelength, pulse duration, ablation environment as well as target composition, density, thickness, roughness. This contribution is addressed to laser ablation of solid targets with the aim of hot plasma generation and thin film deposition on substrates located in appropriate positions in vacuum and in air. In the first section is presented an example of forward and backward plasma accelerations using the sub-nanosecond laser at the PALS laboratory (Czech Republic) for pulsed laser deposition processing. In the second section is reported the use of a nanosecond laser coupled to a post-accelerating compact system employed at the INFN in Catania (Italy) to ablate germanium solid targets in vacuum and to deposit thin films on SiO2/Si substrates to modify their native features. The last section is focused on the use of the nanosecond laser at the Tandetron laboratory (Czech Republic) employed for pulsed laser deposition and laser-induced backward transfer processing in vacuum and in air.
Klasifikace
Druh
J<sub>imp</sub> - Článek v periodiku v databázi Web of Science
CEP obor
—
OECD FORD obor
10304 - Nuclear physics
Návaznosti výsledku
Projekt
—
Návaznosti
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Ostatní
Rok uplatnění
2022
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Údaje specifické pro druh výsledku
Název periodika
Radiation Effects and Defects in Solids
ISSN
1042-0150
e-ISSN
1029-4953
Svazek periodika
177
Číslo periodika v rámci svazku
1-2
Stát vydavatele periodika
GB - Spojené království Velké Británie a Severního Irska
Počet stran výsledku
14
Strana od-do
71-84
Kód UT WoS článku
000771135200001
EID výsledku v databázi Scopus
2-s2.0-85126783947