SiC Measurements of Electron Energy by fs Laser Irradiation of Thin Foils

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389005%3A_____%2F23%3A00572184" target="_blank" >RIV/61389005:_____/23:00572184 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.3390/mi14040811" target="_blank" >https://doi.org/10.3390/mi14040811</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.3390/mi14040811" target="_blank" >10.3390/mi14040811</a>

Jazyk výsledku

angličtina

Název v původním jazyce

SiC Measurements of Electron Energy by fs Laser Irradiation of Thin Foils

Popis výsledku v původním jazyce

SiC detectors based on a Schottky junction represent useful devices to characterize fast laser-generated plasmas. High-intensity fs lasers have been used to irradiate thin foils and to characterize the produced accelerated electrons and ions in the target normal sheath acceleration (TNSA) regime, detecting their emission in the forward direction and at different angles with respect to the normal to the target surface. The electrons' energies have been measured using relativistic relationships applied to their velocity measured by SiC detectors in the time-of-flight (TOF) approach. In view of their high energy resolution, high energy gap, low leakage current, and high response velocity, SiC detectors reveal UV and X-rays, electrons, and ions emitted from the generated laser plasma. The electron and ion emissions can be characterized by energy through the measure of the particle velocities with a limitation at electron relativistic energies since they proceed at a velocity near that of the speed of light and overlap the plasma photon detection. The crucial discrimination between electrons and protons, which are the fastest ions emitted from the plasma, can be well resolved using SiC diodes. Such detectors enable the monitoring of the high ion acceleration obtained using high laser contrast and the absence of ion acceleration using low laser contrast, as presented and discussed.

Název v anglickém jazyce

SiC Measurements of Electron Energy by fs Laser Irradiation of Thin Foils

Popis výsledku anglicky

SiC detectors based on a Schottky junction represent useful devices to characterize fast laser-generated plasmas. High-intensity fs lasers have been used to irradiate thin foils and to characterize the produced accelerated electrons and ions in the target normal sheath acceleration (TNSA) regime, detecting their emission in the forward direction and at different angles with respect to the normal to the target surface. The electrons' energies have been measured using relativistic relationships applied to their velocity measured by SiC detectors in the time-of-flight (TOF) approach. In view of their high energy resolution, high energy gap, low leakage current, and high response velocity, SiC detectors reveal UV and X-rays, electrons, and ions emitted from the generated laser plasma. The electron and ion emissions can be characterized by energy through the measure of the particle velocities with a limitation at electron relativistic energies since they proceed at a velocity near that of the speed of light and overlap the plasma photon detection. The crucial discrimination between electrons and protons, which are the fastest ions emitted from the plasma, can be well resolved using SiC diodes. Such detectors enable the monitoring of the high ion acceleration obtained using high laser contrast and the absence of ion acceleration using low laser contrast, as presented and discussed.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10304 - Nuclear physics

Projekt

<a href="/cs/project/GA23-06702S" target="_blank" >GA23-06702S: Změny elektronové struktury oxidu grafenu cíleným dopováním a modulací defektů iontovými svazky pro mikroelektroniku, katalýzu a senzoriku</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2023

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Micromachines

ISSN

2072-666X

e-ISSN

2072-666X

Svazek periodika

14

Číslo periodika v rámci svazku

4

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

11

Strana od-do

811

Kód UT WoS článku

000978648900001

EID výsledku v databázi Scopus

2-s2.0-85156142032