Optical response of channel waveguides in silicate glass created via ion implantation with optical barriers of varying thickness

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389005%3A_____%2F25%3A00604956" target="_blank" >RIV/61389005:_____/25:00604956 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/44555601:13440/25:43899101 RIV/60461373:22310/25:43931405

Výsledek na webu

<a href="https://www.sciencedirect.com/science/article/pii/S0030399224017912" target="_blank" >https://www.sciencedirect.com/science/article/pii/S0030399224017912</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.optlastec.2024.112333" target="_blank" >10.1016/j.optlastec.2024.112333</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Optical response of channel waveguides in silicate glass created via ion implantation with optical barriers of varying thickness

Popis výsledku v původním jazyce

Channel waveguides have been fabricated through ion implantation combined with photolithography in three types of silicate glass of diverse composition. The range of the implanted ions was different. Channel waveguide was formed by single- and multi-energy C+-ion implantation with different ion fluences, resulting in 1 x 1016 cm-2. The multi-energy implantation processes were performed at energies ranging from 0.8 to 1.6 MeV to establish a 1-mu m wide barrier for the optical signal, positioned approximately 2 mu m below the sample surface. For a precise methodology, Rutherford backscattering spectroscopy (RBS) was initially employed to ascertain the composition of the photoresist mask and, in conjunction with X-ray fluorescence (XRF) analysis, to determine the composition of the glass prior to ion implantation. Subsequently, the dimensions of the photoresist mask, glass compositions, and the derived glass-density values were utilised for SRIM simulations of the projected range of the C+ ion. This led to the creation of channel waveguides and, alternatively, the standard planar waveguides. The range depth of the implanted ions (2.6 mu m) and the waveguide-formation depth calculated (3.0 mu m) using mline spectroscopy were in good agreement. In the silicate glass with the highest Si content, the deepest range of carbon ions was SRIM-simulated, and optical modes (TE0 and TE1) were demonstrated at the wavelength of 473 nm. The increase in the refractive index corresponded to the value of 0.0168 for 473 nm. The effect of glass composition on the waveguide's fabrication was discussed. In addition, there was an evident difference between multi- and single-energy implantation processes. When an optical signal with the wavelength of 473 nm was introduced into the sample, only one mode was propagated for the single-energy implantation of C+ ions, whereas two modes were observed for the multi-energy implantation. The possibility of using multi-energy ion implantation for the controlled preparation of optical waveguides in glass has been demonstrated.

Název v anglickém jazyce

Optical response of channel waveguides in silicate glass created via ion implantation with optical barriers of varying thickness

Popis výsledku anglicky

Channel waveguides have been fabricated through ion implantation combined with photolithography in three types of silicate glass of diverse composition. The range of the implanted ions was different. Channel waveguide was formed by single- and multi-energy C+-ion implantation with different ion fluences, resulting in 1 x 1016 cm-2. The multi-energy implantation processes were performed at energies ranging from 0.8 to 1.6 MeV to establish a 1-mu m wide barrier for the optical signal, positioned approximately 2 mu m below the sample surface. For a precise methodology, Rutherford backscattering spectroscopy (RBS) was initially employed to ascertain the composition of the photoresist mask and, in conjunction with X-ray fluorescence (XRF) analysis, to determine the composition of the glass prior to ion implantation. Subsequently, the dimensions of the photoresist mask, glass compositions, and the derived glass-density values were utilised for SRIM simulations of the projected range of the C+ ion. This led to the creation of channel waveguides and, alternatively, the standard planar waveguides. The range depth of the implanted ions (2.6 mu m) and the waveguide-formation depth calculated (3.0 mu m) using mline spectroscopy were in good agreement. In the silicate glass with the highest Si content, the deepest range of carbon ions was SRIM-simulated, and optical modes (TE0 and TE1) were demonstrated at the wavelength of 473 nm. The increase in the refractive index corresponded to the value of 0.0168 for 473 nm. The effect of glass composition on the waveguide's fabrication was discussed. In addition, there was an evident difference between multi- and single-energy implantation processes. When an optical signal with the wavelength of 473 nm was introduced into the sample, only one mode was propagated for the single-energy implantation of C+ ions, whereas two modes were observed for the multi-energy implantation. The possibility of using multi-energy ion implantation for the controlled preparation of optical waveguides in glass has been demonstrated.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10301 - Atomic, molecular and chemical physics (physics of atoms and molecules including collision, interaction with radiation, magnetic resonances, Mössbauer effect)

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2025

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Optics and Laser Technology

ISSN

0030-3992

e-ISSN

1879-2545

Svazek periodika

183

Číslo periodika v rámci svazku

May

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

12

Strana od-do

112333

Kód UT WoS článku

001392941700001

EID výsledku v databázi Scopus

2-s2.0-85212573009