An extreme ultraviolet interferometer suitable to generate dense interference pattern

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389021%3A_____%2F14%3A00436667" target="_blank" >RIV/61389021:_____/14:00436667 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1117/12.2061858" target="_blank" >http://dx.doi.org/10.1117/12.2061858</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1117/12.2061858" target="_blank" >10.1117/12.2061858</a>

Jazyk výsledku

angličtina

Název v původním jazyce

An extreme ultraviolet interferometer suitable to generate dense interference pattern

Popis výsledku v původním jazyce

t has been designed a new type of interferometer working in extreme ultraviolet (XUV) region and intended for direct imprinting of densest possible (for given wavelength) interference pattern into a substrate. The interferometer belongs to the wave-frontdivision category: each of its two aspheric mirrors reflects approximately one half of incoming laser beam and focuses it into a point image. Both focused beams have to intersect each other, and in the intersection region an interference pattern is generated. The closer the intersection region is to the above-mentioned point images, the smaller the interference field is, but simultaneously the smaller the fringe-pitch is. This paper describes interferometer design (inclusive fringe-pitch calculation, and inclusive design of multilayer reflection coatings for the wavelength 46.9 nm (Ar8+ laser) -ensuring equal reflectivity at different reflection angles).The interferometer design is supplemented not only by ray-tracing verification

Název v anglickém jazyce

An extreme ultraviolet interferometer suitable to generate dense interference pattern

Popis výsledku anglicky

t has been designed a new type of interferometer working in extreme ultraviolet (XUV) region and intended for direct imprinting of densest possible (for given wavelength) interference pattern into a substrate. The interferometer belongs to the wave-frontdivision category: each of its two aspheric mirrors reflects approximately one half of incoming laser beam and focuses it into a point image. Both focused beams have to intersect each other, and in the intersection region an interference pattern is generated. The closer the intersection region is to the above-mentioned point images, the smaller the interference field is, but simultaneously the smaller the fringe-pitch is. This paper describes interferometer design (inclusive fringe-pitch calculation, and inclusive design of multilayer reflection coatings for the wavelength 46.9 nm (Ar8+ laser) -ensuring equal reflectivity at different reflection angles).The interferometer design is supplemented not only by ray-tracing verification

Druh

D - Stať ve sborníku

CEP obor

BH - Optika, masery a lasery

OECD FORD obor

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Projekt

<a href="/cs/project/LG13029" target="_blank" >LG13029: Výzkum v rámci Mezinárodního centra hustého magnetizovaného plazmatu</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2014

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

Proceedings of SPIE 9206, Advances in Metrology for X-Ray and EUV Optics V

ISBN

978-1-62841-233-8

ISSN

0277-786X

e-ISSN

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Počet stran výsledku

10

Strana od-do

"92060D"-"92060D"

Název nakladatele

SPIE

Místo vydání

Bellingham

Místo konání akce

San Diego

Datum konání akce

19. 8. 2014

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

000343876300008