Electron injection on steep ramp-up plasma density profiles in high repetition rate laser-plasma wake-field accelerators

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389021%3A_____%2F23%3A00584201" target="_blank" >RIV/61389021:_____/23:00584201 - isvavai.cz</a>

Výsledek na webu

<a href="https://www.spiedigitallibrary.org/conference-proceedings-of-spie/12579/2660115/Electron-injection-on-steep-ramp-up-plasma-density-profiles-in/10.1117/12.2660115.short" target="_blank" >https://www.spiedigitallibrary.org/conference-proceedings-of-spie/12579/2660115/Electron-injection-on-steep-ramp-up-plasma-density-profiles-in/10.1117/12.2660115.short</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1117/12.2660115" target="_blank" >10.1117/12.2660115</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Electron injection on steep ramp-up plasma density profiles in high repetition rate laser-plasma wake-field accelerators

Popis výsledku v původním jazyce

Electron acceleration by laser pulses with high repetition rate can be used for technical applications. To reach conditions for the wake-field laser acceleration, it was demonstrated recently in experiments that it is beneficial to use near single cycle laser drive pulses with sub-4 fs duration, with narrow waists. To explore possible electron density ramp-up injection as an alternative to ramp-down and ionization injections, we performed numerical simulations of electron bunches generation in the ramp-up region. The PIC code Epoch2D and input parameters near to experiments were used. We assumed thin plasma slabs with super Gaussian density profiles of order 4-80, FWHM about 30 μm. We found that density ramp-up injected bunches can have charges several times higher than those obtained by ionization injection. There can be created a group of up to ten bunches in a sequence of bubbles, with not too mutually different maximum energy and charges. At oblique incidence of drive pulses on steep ramp up profiles, we find significant enhancement of the first bunch charge. For large slant angles45 or 45 degrees, the bunch charge enhancement is about twenty times. We conclude that the ramp-up injection can be a useful alternative injection on steep enough density profiles.

Název v anglickém jazyce

Electron injection on steep ramp-up plasma density profiles in high repetition rate laser-plasma wake-field accelerators

Popis výsledku anglicky

Electron acceleration by laser pulses with high repetition rate can be used for technical applications. To reach conditions for the wake-field laser acceleration, it was demonstrated recently in experiments that it is beneficial to use near single cycle laser drive pulses with sub-4 fs duration, with narrow waists. To explore possible electron density ramp-up injection as an alternative to ramp-down and ionization injections, we performed numerical simulations of electron bunches generation in the ramp-up region. The PIC code Epoch2D and input parameters near to experiments were used. We assumed thin plasma slabs with super Gaussian density profiles of order 4-80, FWHM about 30 μm. We found that density ramp-up injected bunches can have charges several times higher than those obtained by ionization injection. There can be created a group of up to ten bunches in a sequence of bubbles, with not too mutually different maximum energy and charges. At oblique incidence of drive pulses on steep ramp up profiles, we find significant enhancement of the first bunch charge. For large slant angles45 or 45 degrees, the bunch charge enhancement is about twenty times. We conclude that the ramp-up injection can be a useful alternative injection on steep enough density profiles.

Druh

D - Stať ve sborníku

CEP obor

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OECD FORD obor

10305 - Fluids and plasma physics (including surface physics)

Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2023

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

Proceedings of SPIE - The International Society for Optical Engineering

ISBN

978-151066552-1

ISSN

—

e-ISSN

—

Počet stran výsledku

16

Strana od-do

"Roč. 12579 (2023)"

Název nakladatele

SPIE

Místo vydání

Bellingham

Místo konání akce

Praha

Datum konání akce

25. 4. 2023

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

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