Deposition of Nanostructured Ag Films on Silicon Wafers by Electrochemical/Electrophoretic Deposition for Electrochemical and SERS Sensing

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989592%3A15310%2F13%3A33145700" target="_blank" >RIV/61989592:15310/13:33145700 - isvavai.cz</a>

Výsledek na webu

<a href="http://dx.doi.org/10.1149/2.003306jes" target="_blank" >http://dx.doi.org/10.1149/2.003306jes</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1149/2.003306jes" target="_blank" >10.1149/2.003306jes</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Deposition of Nanostructured Ag Films on Silicon Wafers by Electrochemical/Electrophoretic Deposition for Electrochemical and SERS Sensing

Popis výsledku v původním jazyce

Electrolysis of ultrapure water in a two-electrode cell with silver anode and conductive substrate (Si wafer) as a cathode leads to the formation of nanostructured silver layers deposited on cathode. In the process, the silver anode is electrochemicallydissolved to silver cations, which react with water (or OH center dot radicals derived from water electrolysis) forming silver oxide nanoparticles, which fill the interelectrode space by electrophoretic movement, diffusion and convection induced by temperature effects of electrolysis. During the process the silver oxide nanoparticles are partially transformed into silver nanoparticles. On the cathode, silver cations and silver! silver oxide nanoparticles undergo reduction to form nanostructured silver film. The results of the present study open a new, extremely simple and ultra-low cost way to prepare nanostructured silver films on conducting and semiconducting substrates. The prepared nanosilver coated silicon substrates exhibit high p

Název v anglickém jazyce

Deposition of Nanostructured Ag Films on Silicon Wafers by Electrochemical/Electrophoretic Deposition for Electrochemical and SERS Sensing

Popis výsledku anglicky

Electrolysis of ultrapure water in a two-electrode cell with silver anode and conductive substrate (Si wafer) as a cathode leads to the formation of nanostructured silver layers deposited on cathode. In the process, the silver anode is electrochemicallydissolved to silver cations, which react with water (or OH center dot radicals derived from water electrolysis) forming silver oxide nanoparticles, which fill the interelectrode space by electrophoretic movement, diffusion and convection induced by temperature effects of electrolysis. During the process the silver oxide nanoparticles are partially transformed into silver nanoparticles. On the cathode, silver cations and silver! silver oxide nanoparticles undergo reduction to form nanostructured silver film. The results of the present study open a new, extremely simple and ultra-low cost way to prepare nanostructured silver films on conducting and semiconducting substrates. The prepared nanosilver coated silicon substrates exhibit high p

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

CG - Elektrochemie

OECD FORD obor

—

Projekt

<a href="/cs/project/GAP206%2F12%2F0796" target="_blank" >GAP206/12/0796: Elektrody z uhlíkového mikrovlákna modifikované povrchovými úpravami a nanostrukturovanými kovovými povlaky jako vysoce citlivé HPLC-EC detektory</a><br>

Návaznosti

S - Specificky vyzkum na vysokych skolach

Rok uplatnění

2013

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of the Electrochemical Society

ISSN

0013-4651

e-ISSN

—

Svazek periodika

160

Číslo periodika v rámci svazku

4

Stát vydavatele periodika

US - Spojené státy americké

Počet stran výsledku

6

Strana od-do

54-59

Kód UT WoS článku

000316976800038

EID výsledku v databázi Scopus

—