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Reactivity of fluorographene is triggered by point defects: beyond the perfect 2D world

Identifikátory výsledku

  • Kód výsledku v IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989592%3A15310%2F18%3A73591353" target="_blank" >RIV/61989592:15310/18:73591353 - isvavai.cz</a>

  • Výsledek na webu

    <a href="https://pubs.rsc.org/en/content/articlepdf/2018/nr/c7nr09426d" target="_blank" >https://pubs.rsc.org/en/content/articlepdf/2018/nr/c7nr09426d</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1039/c7nr09426d" target="_blank" >10.1039/c7nr09426d</a>

Alternativní jazyky

  • Jazyk výsledku

    angličtina

  • Název v původním jazyce

    Reactivity of fluorographene is triggered by point defects: beyond the perfect 2D world

  • Popis výsledku v původním jazyce

    Preparation of graphene derivatives using fluorographene (FG) as a precursor has become a key strategy for the large-scale synthesis of new 2-D materials (e.g. graphene acid, cyanographene, allyl-graphene) with tailored physicochemical properties. However, to gain full control over the derivatization process, it is essential to understand the reaction mechanisms and accompanying processes that affect the composition and structure of the final products. Despite the strength of C-F bonds and high chemical stability of perfluorinated hydrocarbons, FG is surprisingly susceptible to reactions under ambient conditions. There is clear evidence that nucleophilic substitution on FG is accompanied by spontaneous defluorination, and solvent-induced defluorination can occur even in the absence of any nucleophilic agent. Here, we show that distributed radical centers (fluorine vacancies) on the FG surface need to be taken into account in order to rationalize the defluorination mechanism. Depending on the environment, these radical centers can react as electron acceptors, electrophilic sites and/or cause homolytic bond cleavages. We also propose a new radical mechanism of FG defluorination in the presence of N,N&apos;-dimethylformamide (DMF) solvent. Spin-trap experiments as well as F-19 NMR measurements unambiguously confirmed formation of N,N&apos;-dimethylformyl radicals and also showed that N,N&apos;-dimethylcarbamoyl fluoride plays a key role in the proposed mechanism. These findings imply that point defects in 2D materials should be considered as key factor determining their chemical properties and reactivity.

  • Název v anglickém jazyce

    Reactivity of fluorographene is triggered by point defects: beyond the perfect 2D world

  • Popis výsledku anglicky

    Preparation of graphene derivatives using fluorographene (FG) as a precursor has become a key strategy for the large-scale synthesis of new 2-D materials (e.g. graphene acid, cyanographene, allyl-graphene) with tailored physicochemical properties. However, to gain full control over the derivatization process, it is essential to understand the reaction mechanisms and accompanying processes that affect the composition and structure of the final products. Despite the strength of C-F bonds and high chemical stability of perfluorinated hydrocarbons, FG is surprisingly susceptible to reactions under ambient conditions. There is clear evidence that nucleophilic substitution on FG is accompanied by spontaneous defluorination, and solvent-induced defluorination can occur even in the absence of any nucleophilic agent. Here, we show that distributed radical centers (fluorine vacancies) on the FG surface need to be taken into account in order to rationalize the defluorination mechanism. Depending on the environment, these radical centers can react as electron acceptors, electrophilic sites and/or cause homolytic bond cleavages. We also propose a new radical mechanism of FG defluorination in the presence of N,N&apos;-dimethylformamide (DMF) solvent. Spin-trap experiments as well as F-19 NMR measurements unambiguously confirmed formation of N,N&apos;-dimethylformyl radicals and also showed that N,N&apos;-dimethylcarbamoyl fluoride plays a key role in the proposed mechanism. These findings imply that point defects in 2D materials should be considered as key factor determining their chemical properties and reactivity.

Klasifikace

  • Druh

    J<sub>imp</sub> - Článek v periodiku v databázi Web of Science

  • CEP obor

  • OECD FORD obor

    10403 - Physical chemistry

Návaznosti výsledku

  • Projekt

    Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

  • Návaznosti

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Ostatní

  • Rok uplatnění

    2018

  • Kód důvěrnosti údajů

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Údaje specifické pro druh výsledku

  • Název periodika

    Nanoscale

  • ISSN

    2040-3364

  • e-ISSN

  • Svazek periodika

    10

  • Číslo periodika v rámci svazku

    10

  • Stát vydavatele periodika

    GB - Spojené království Velké Británie a Severního Irska

  • Počet stran výsledku

    12

  • Strana od-do

    4696-4707

  • Kód UT WoS článku

    000428786800010

  • EID výsledku v databázi Scopus

    2-s2.0-85043500437