Acid scarification as a potent treatment for an in vitro germination of mature endozoochorous Vanilla planifolia seeds

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F67985939%3A_____%2F23%3A00571563" target="_blank" >RIV/67985939:_____/23:00571563 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/00216208:11310/23:10468043

Výsledek na webu

<a href="https://doi.org/10.1186/s40529-023-00374-z" target="_blank" >https://doi.org/10.1186/s40529-023-00374-z</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1186/s40529-023-00374-z" target="_blank" >10.1186/s40529-023-00374-z</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Acid scarification as a potent treatment for an in vitro germination of mature endozoochorous Vanilla planifolia seeds

Popis výsledku v původním jazyce

Vanilla planifolia is the most widely cultivated species of vanilla with high economic importance. However, seed germination under artificial conditions is difficult and yields low germination percentages. The seeds are adapted to endozoochorous dispersal, and we therefore tried to simulate the conditions in the digestive tract by acid scarification of seeds.Immature seeds lacking dormancy, used as a control, showed the highest germination percentage. Among the treatments tested for mature seeds, the hydrochloric acid treatments were significantly the best in breaking dormancy and inducing germination, irrespective of the acid concentration and the presence of pepsin. Conventional treatment with a hypochlorite solution induced much lower germination percentage. Sulphuric acid at concentration 50% was too strong and caused damage to the seeds. Important factor is also high cultivation temperature 30 degrees C as there was nearly no germination at 25 degrees C.Our protocol significantly improves the efficiency of generative propagation of vanilla and allows for significantly higher germination percentages than previously described. The strongly positive effect of hydrochloric acid may be related to the adaptation of seeds to endozoochorous dispersal.

Název v anglickém jazyce

Acid scarification as a potent treatment for an in vitro germination of mature endozoochorous Vanilla planifolia seeds

Popis výsledku anglicky

Vanilla planifolia is the most widely cultivated species of vanilla with high economic importance. However, seed germination under artificial conditions is difficult and yields low germination percentages. The seeds are adapted to endozoochorous dispersal, and we therefore tried to simulate the conditions in the digestive tract by acid scarification of seeds.Immature seeds lacking dormancy, used as a control, showed the highest germination percentage. Among the treatments tested for mature seeds, the hydrochloric acid treatments were significantly the best in breaking dormancy and inducing germination, irrespective of the acid concentration and the presence of pepsin. Conventional treatment with a hypochlorite solution induced much lower germination percentage. Sulphuric acid at concentration 50% was too strong and caused damage to the seeds. Important factor is also high cultivation temperature 30 degrees C as there was nearly no germination at 25 degrees C.Our protocol significantly improves the efficiency of generative propagation of vanilla and allows for significantly higher germination percentages than previously described. The strongly positive effect of hydrochloric acid may be related to the adaptation of seeds to endozoochorous dispersal.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10611 - Plant sciences, botany

Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2023

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Botanical Studies

ISSN

1999-3110

e-ISSN

1999-3110

Svazek periodika

64

Číslo periodika v rámci svazku

1

Stát vydavatele periodika

TW - Čínská republika (Tchaj-wan)

Počet stran výsledku

10

Strana od-do

9

Kód UT WoS článku

000969413200001

EID výsledku v databázi Scopus

2-s2.0-85153318026