Some Other Gratings: Benchmarks for Large-Area E-Beam Nanopatterning

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F14%3A00437840" target="_blank" >RIV/68081731:_____/14:00437840 - isvavai.cz</a>

Výsledek na webu

—

DOI - Digital Object Identifier

—

Jazyk výsledku

angličtina

Název v původním jazyce

Some Other Gratings: Benchmarks for Large-Area E-Beam Nanopatterning

Popis výsledku v původním jazyce

E-beam lithography is a flexible technology for diffraction gratings origination. Nevertheless, requirements of the high optical quality of large area diffractive structures imply various severe challenges to e-beam delineating processes. This paper summarizes the e-beam process parameters that influence the quality of large area grating structures. Next, we propose some new methods to prepare diffraction gratings that were found to be useful for testing and benchmarking purposes. Those methods includesingle line gratings, labyrinth structures, fractional structures, tiling patterns, quasi regular filling structures and forked line structures. Various samples were prepared with the standard and newly developed e-beam patterning processes using both e-beam writers available: one with the Gaussian beam at 100 keV and another one with the shaped beam at 15 keV. Some of the results are presented further in this paper, their variants and parameters are discussed as well as their usefulness

Název v anglickém jazyce

Some Other Gratings: Benchmarks for Large-Area E-Beam Nanopatterning

Popis výsledku anglicky

E-beam lithography is a flexible technology for diffraction gratings origination. Nevertheless, requirements of the high optical quality of large area diffractive structures imply various severe challenges to e-beam delineating processes. This paper summarizes the e-beam process parameters that influence the quality of large area grating structures. Next, we propose some new methods to prepare diffraction gratings that were found to be useful for testing and benchmarking purposes. Those methods includesingle line gratings, labyrinth structures, fractional structures, tiling patterns, quasi regular filling structures and forked line structures. Various samples were prepared with the standard and newly developed e-beam patterning processes using both e-beam writers available: one with the Gaussian beam at 100 keV and another one with the shaped beam at 15 keV. Some of the results are presented further in this paper, their variants and parameters are discussed as well as their usefulness

Druh

D - Stať ve sborníku

CEP obor

BH - Optika, masery a lasery

OECD FORD obor

—

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2014

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

NANOCON 2014. 6th International conference proceedings

ISBN

978-80-87294-55-0

ISSN

—

e-ISSN

—

Počet stran výsledku

6

Strana od-do

—

Název nakladatele

TANGER

Místo vydání

Ostrava

Místo konání akce

Brno

Datum konání akce

5. 11. 2014

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

—