A sampler of diffraction and refraction optically variable image elements

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F21%3A00564672" target="_blank" >RIV/68081731:_____/21:00564672 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/00007064:K01__/21:N0000122

Výsledek na webu

<a href="https://www.confer.cz/nanocon/2021/4371-a-sampler-of-diffraction-and-refraction-optically-variable-image-elements" target="_blank" >https://www.confer.cz/nanocon/2021/4371-a-sampler-of-diffraction-and-refraction-optically-variable-image-elements</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.37904/nanocon.2021.4371" target="_blank" >10.37904/nanocon.2021.4371</a>

Jazyk výsledku

angličtina

Název v původním jazyce

A sampler of diffraction and refraction optically variable image elements

Popis výsledku v původním jazyce

Diffraction and refraction optically variable image elements are basic building blocks of planar structures for advanced security of documents and valuables. A sampler formed by an array of 36 diffraction structures binary, tertiary, quaternary and blazed gratings (period range 400 nm 20,000 nm) represents a cross-section throughout technological steps mastering, galvanic replication and embossing. Electron-beam writing technology with Gaussian beam and electron energy of 100 keV, with very small forward scattering of high energy electrons and with the possibilities to create a linear grating with the minimal period of 100 nm, was used to create the master. An important advantage of high-resolution electron-beam lithography is its substantial flexibility in combining possible planar structures with significantly different parameters, such as very dense and relatively shallow structures together with deep structures (approx. 10 microns) with precise shapes (micro-lenses or Fresnel structures). For protection of documents and valuables, interesting results are induced with planar optical structures consisting of non-periodic arrangements, which are characterized by high robustness to counterfeiting and imitation. While the origination process is available for grating period down to 100 nm, the mass replication technology appears to be a bottleneck of the entire technological process. Measurement of topology and profiles of the structures by atomic forces microscope and documenting the quality of technological process of the three steps of replication of planar optically variable elements was performed for all 36 structure types of sampler.

Název v anglickém jazyce

A sampler of diffraction and refraction optically variable image elements

Popis výsledku anglicky

Diffraction and refraction optically variable image elements are basic building blocks of planar structures for advanced security of documents and valuables. A sampler formed by an array of 36 diffraction structures binary, tertiary, quaternary and blazed gratings (period range 400 nm 20,000 nm) represents a cross-section throughout technological steps mastering, galvanic replication and embossing. Electron-beam writing technology with Gaussian beam and electron energy of 100 keV, with very small forward scattering of high energy electrons and with the possibilities to create a linear grating with the minimal period of 100 nm, was used to create the master. An important advantage of high-resolution electron-beam lithography is its substantial flexibility in combining possible planar structures with significantly different parameters, such as very dense and relatively shallow structures together with deep structures (approx. 10 microns) with precise shapes (micro-lenses or Fresnel structures). For protection of documents and valuables, interesting results are induced with planar optical structures consisting of non-periodic arrangements, which are characterized by high robustness to counterfeiting and imitation. While the origination process is available for grating period down to 100 nm, the mass replication technology appears to be a bottleneck of the entire technological process. Measurement of topology and profiles of the structures by atomic forces microscope and documenting the quality of technological process of the three steps of replication of planar optically variable elements was performed for all 36 structure types of sampler.

Druh

D - Stať ve sborníku

CEP obor

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OECD FORD obor

21002 - Nano-processes (applications on nano-scale); (biomaterials to be 2.9)

Projekt

<a href="/cs/project/VI20192022147" target="_blank" >VI20192022147: Difraktivní a refraktivní optika pro pokročilé zabezpečení dokumentů a cenin</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

NANOCON 2021 - Conference proceedings

ISBN

978-80-88365-00-6

ISSN

2694-930X

e-ISSN

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Počet stran výsledku

6

Strana od-do

436-441

Název nakladatele

Tanger Ltd.

Místo vydání

Ostrava

Místo konání akce

Brno

Datum konání akce

20. 10. 2021

Typ akce podle státní příslušnosti

WRD - Celosvětová akce

Kód UT WoS článku

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