Highly Sensitive Plasmonic Structures Utilizing a Silicon Dioxide Overlayer

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F22%3A00561882" target="_blank" >RIV/68081731:_____/22:00561882 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/61989100:27240/22:10250602

Výsledek na webu

<a href="https://www.mdpi.com/2079-4991/12/18/3090" target="_blank" >https://www.mdpi.com/2079-4991/12/18/3090</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.3390/nano12183090" target="_blank" >10.3390/nano12183090</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Highly Sensitive Plasmonic Structures Utilizing a Silicon Dioxide Overlayer

Popis výsledku v původním jazyce

In this paper, simple and highly sensitive plasmonic structures are analyzed theoretically and experimentally. A structure comprising a glass substrate with a gold layer, two adhesion layers of chromium, and a silicon dioxide overlayer is employed in liquid analyte sensing. The sensing properties of two structures with distinct protective layer thicknesses are derived based on a wavelength interrogation method. Spectral reflectance responses in the Kretschmann configuration with a coupling BK7 prism are presented, using the thicknesses of individual layers obtained by a method of spectral ellipsometry. In the measured spectral reflectance, a pronounced dip is resolved, which is strongly red-shifted as the refractive index (RI) of the analyte increases. Consequently, a sensitivity of 15,785 nm per RI unit (RIU) and a figure of merit (FOM) of 37.9 RIU-1 are reached for the silicon dioxide overlayer thickness of 147.5 nm. These results are in agreement with the theoretical ones, confirming that both the sensitivity and FOM can be enhanced using a thicker silicon dioxide overlayer. The designed structures prove to be advantageous as their durable design ensures the repeatability of measurement and extends their employment compared to regularly used structures for aqueous analyte sensing.

Název v anglickém jazyce

Highly Sensitive Plasmonic Structures Utilizing a Silicon Dioxide Overlayer

Popis výsledku anglicky

In this paper, simple and highly sensitive plasmonic structures are analyzed theoretically and experimentally. A structure comprising a glass substrate with a gold layer, two adhesion layers of chromium, and a silicon dioxide overlayer is employed in liquid analyte sensing. The sensing properties of two structures with distinct protective layer thicknesses are derived based on a wavelength interrogation method. Spectral reflectance responses in the Kretschmann configuration with a coupling BK7 prism are presented, using the thicknesses of individual layers obtained by a method of spectral ellipsometry. In the measured spectral reflectance, a pronounced dip is resolved, which is strongly red-shifted as the refractive index (RI) of the analyte increases. Consequently, a sensitivity of 15,785 nm per RI unit (RIU) and a figure of merit (FOM) of 37.9 RIU-1 are reached for the silicon dioxide overlayer thickness of 147.5 nm. These results are in agreement with the theoretical ones, confirming that both the sensitivity and FOM can be enhanced using a thicker silicon dioxide overlayer. The designed structures prove to be advantageous as their durable design ensures the repeatability of measurement and extends their employment compared to regularly used structures for aqueous analyte sensing.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10306 - Optics (including laser optics and quantum optics)

Projekt

<a href="/cs/project/EF17_048%2F0007399" target="_blank" >EF17_048/0007399: Nové kompozitní materiály pro environmentální aplikace</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2022

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Nanomaterials

ISSN

2079-4991

e-ISSN

2079-4991

Svazek periodika

12

Číslo periodika v rámci svazku

18

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

13

Strana od-do

3090

Kód UT WoS článku

000857073900001

EID výsledku v databázi Scopus

2-s2.0-85138715666