In situ XPS characterization of diamond films after AR+ cluster ion beam sputtering

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F15%3A00452710" target="_blank" >RIV/68378271:_____/15:00452710 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

In situ XPS characterization of diamond films after AR+ cluster ion beam sputtering

Popis výsledku v původním jazyce

In this work, in situ XPS analysis of chemical composition of H- and O-terminated nano- and microcrystalline diamond (NCD and MCD) films before and after their sputtering by the Ar+ cluster ion beam was investigated. Scanning electron microscopy confirmed sputtering of all diamond surfaces with a rate about 0.5 nm/min. Raman spectroscopy and XPS revealed surface graphitization of diamond surface induced by sputtering. Moreover, XPS data showed the presence of about 0.7 % of Ar atoms on the investigated diamond surface after 66 min of sputtering. Also, oxygen residuals were still presented on the H-NCD surface after 66 min of sputtering. In contrast, no oxygen was found on the H-MCD surface just after 2 min of sputtering. Surface composition is discussed in respect to the diamond films growth parameters and surface structure.

Název v anglickém jazyce

In situ XPS characterization of diamond films after AR+ cluster ion beam sputtering

Popis výsledku anglicky

In this work, in situ XPS analysis of chemical composition of H- and O-terminated nano- and microcrystalline diamond (NCD and MCD) films before and after their sputtering by the Ar+ cluster ion beam was investigated. Scanning electron microscopy confirmed sputtering of all diamond surfaces with a rate about 0.5 nm/min. Raman spectroscopy and XPS revealed surface graphitization of diamond surface induced by sputtering. Moreover, XPS data showed the presence of about 0.7 % of Ar atoms on the investigated diamond surface after 66 min of sputtering. Also, oxygen residuals were still presented on the H-NCD surface after 66 min of sputtering. In contrast, no oxygen was found on the H-MCD surface just after 2 min of sputtering. Surface composition is discussed in respect to the diamond films growth parameters and surface structure.

Druh

D - Stať ve sborníku

CEP obor

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OECD FORD obor

10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Projekt

<a href="/cs/project/GA15-01687S" target="_blank" >GA15-01687S: Alotropní formy uhlíku: mikrobiologické studie</a><br>

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2015

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název statě ve sborníku

NANOCON 2015: 7th International Conference on Nanomaterials - Research and Application, Conference Proceedings

ISBN

978-80-87294-63-5

ISSN

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e-ISSN

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Počet stran výsledku

6

Strana od-do

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Název nakladatele

TANGER, spol. s r.o.

Místo vydání

Ostrava

Místo konání akce

Brno

Datum konání akce

14. 10. 2015

Typ akce podle státní příslušnosti

EUR - Evropská akce

Kód UT WoS článku

000374708800105