Voltammetric characterization of boron-doped diamond electrodes for electroanalytical applications

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F20%3A00536164" target="_blank" >RIV/68378271:_____/20:00536164 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.1016/j.jelechem.2020.114020" target="_blank" >https://doi.org/10.1016/j.jelechem.2020.114020</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.jelechem.2020.114020" target="_blank" >10.1016/j.jelechem.2020.114020</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Voltammetric characterization of boron-doped diamond electrodes for electroanalytical applications

Popis výsledku v původním jazyce

The boron-doped diamond (BDD) electrodes prepared by chemical vapor deposition on alumina substrates were electrochemically characterized by cyclic voltammetry. The influence was investigated of the boron dopant concentration, surface termination as well as chemical surface treatment on the kinetics of the electrode reaction. The effect of surface conditions of the boron-doped diamond electrodes on the kinetics of the electrodeposition of bismuth film was investigated for electrochemical applications in which bismuth film electrodes are utilized. A favourable effect of the cleaning procedures was proved, especially for the oxygen plasma-treated BDD electrode with a higher content of boron in alkaline solution. The anodic current response increased by 109% as compared with as-grown BDD. The effect of the quality of bismuth film on analytical performance of the voltammetric sensor was verified in simultaneous analysis of heavy metals (Pb, Cd and Zn) by anodic stripping voltammetry.

Název v anglickém jazyce

Voltammetric characterization of boron-doped diamond electrodes for electroanalytical applications

Popis výsledku anglicky

The boron-doped diamond (BDD) electrodes prepared by chemical vapor deposition on alumina substrates were electrochemically characterized by cyclic voltammetry. The influence was investigated of the boron dopant concentration, surface termination as well as chemical surface treatment on the kinetics of the electrode reaction. The effect of surface conditions of the boron-doped diamond electrodes on the kinetics of the electrodeposition of bismuth film was investigated for electrochemical applications in which bismuth film electrodes are utilized. A favourable effect of the cleaning procedures was proved, especially for the oxygen plasma-treated BDD electrode with a higher content of boron in alkaline solution. The anodic current response increased by 109% as compared with as-grown BDD. The effect of the quality of bismuth film on analytical performance of the voltammetric sensor was verified in simultaneous analysis of heavy metals (Pb, Cd and Zn) by anodic stripping voltammetry.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

10406 - Analytical chemistry

Projekt

—

Návaznosti

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Rok uplatnění

2020

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Journal of Electroanalytical Chemistry

ISSN

1572-6657

e-ISSN

—

Svazek periodika

862

Číslo periodika v rámci svazku

Apr

Stát vydavatele periodika

CH - Švýcarská konfederace

Počet stran výsledku

9

Strana od-do

1-9

Kód UT WoS článku

000525903900035

EID výsledku v databázi Scopus

2-s2.0-85080956059