In-situ plasma monitoring by optical emission spectroscopy during pulsed laser deposition of doped Lu2O3

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F21%3A00546180" target="_blank" >RIV/68378271:_____/21:00546180 - isvavai.cz</a>

Nalezeny alternativní kódy

RIV/60461373:22340/21:43922953

Výsledek na webu

<a href="https://doi.org/10.1007/s00340-021-07689-4" target="_blank" >https://doi.org/10.1007/s00340-021-07689-4</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1007/s00340-021-07689-4" target="_blank" >10.1007/s00340-021-07689-4</a>

Jazyk výsledku

angličtina

Název v původním jazyce

In-situ plasma monitoring by optical emission spectroscopy during pulsed laser deposition of doped Lu2O3

Popis výsledku v původním jazyce

The control and arguably the tailoring aspect of technologies like pulsed laser deposition (PLD) rises from understanding the chemistry hidden by the laser generated plasma. With the continuous transition towards thin films with complex structures and geometries, the comprehension of the fundamental processes during the film deposition becomes critical. During the PLD of Mo and Eu-doped Lu2O3, optical emission spectroscopy was implemented for in-situ plasma monitoring. The spatial distribution of individual elements revealed the structuring of a stoichiometric plasma while the formation of LuO molecule within the plasma plume is seen as being induced by the addition of a minimum 1 Pa of O2. The energy of the ejected particles was controlled through doping and O2 pressure.

Název v anglickém jazyce

In-situ plasma monitoring by optical emission spectroscopy during pulsed laser deposition of doped Lu2O3

Popis výsledku anglicky

The control and arguably the tailoring aspect of technologies like pulsed laser deposition (PLD) rises from understanding the chemistry hidden by the laser generated plasma. With the continuous transition towards thin films with complex structures and geometries, the comprehension of the fundamental processes during the film deposition becomes critical. During the PLD of Mo and Eu-doped Lu2O3, optical emission spectroscopy was implemented for in-situ plasma monitoring. The spatial distribution of individual elements revealed the structuring of a stoichiometric plasma while the formation of LuO molecule within the plasma plume is seen as being induced by the addition of a minimum 1 Pa of O2. The energy of the ejected particles was controlled through doping and O2 pressure.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20506 - Coating and films

Projekt

Výsledek vznikl pri realizaci vícero projektů. Více informací v záložce Projekty.

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Applied Physics B-Lasers and Optics

ISSN

0946-2171

e-ISSN

1432-0649

Svazek periodika

127

Číslo periodika v rámci svazku

10

Stát vydavatele periodika

DE - Spolková republika Německo

Počet stran výsledku

9

Strana od-do

140

Kód UT WoS článku

000696523600001

EID výsledku v databázi Scopus

2-s2.0-85115095563