Modeling thermal response of Mo thin films upon single femtosecond laser irradiation: Dynamics of film melting and substrate softening
Identifikátory výsledku
Kód výsledku v IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F22%3A00560660" target="_blank" >RIV/68378271:_____/22:00560660 - isvavai.cz</a>
Nalezeny alternativní kódy
RIV/68407700:21340/22:00359170
Výsledek na webu
<a href="https://doi.org/10.1016/j.ijheatmasstransfer.2022.123292" target="_blank" >https://doi.org/10.1016/j.ijheatmasstransfer.2022.123292</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.ijheatmasstransfer.2022.123292" target="_blank" >10.1016/j.ijheatmasstransfer.2022.123292</a>
Alternativní jazyky
Jazyk výsledku
angličtina
Název v původním jazyce
Modeling thermal response of Mo thin films upon single femtosecond laser irradiation: Dynamics of film melting and substrate softening
Popis výsledku v původním jazyce
Energy relaxation in a thin molybdenum film exposed to a single laser pulse (wavelength 400 nm, pulse duration 200 fs at FWHM) has been investigated numerically. For this purpose, a two-temperature model was used accounting for the optical and thermodynamical properties of molybdenum deposited on a selection of substrates. The effect of the substrate on laser-induced film heating has been studied for the cases of fused silica, silicon, soda-lime glass as well as for a free-standing film. For a fused silica substrate, the calculated melting threshold fluence is in a good agreement with thickness-dependent experimental data available in literature. It has been found that, for Mo films with the thickness 107 nm, the softening point of the fused silica substrate is exceeded already at the Mo melting threshold fluence. This suggests the possibility of substrate damage related to glass deformation.
Název v anglickém jazyce
Modeling thermal response of Mo thin films upon single femtosecond laser irradiation: Dynamics of film melting and substrate softening
Popis výsledku anglicky
Energy relaxation in a thin molybdenum film exposed to a single laser pulse (wavelength 400 nm, pulse duration 200 fs at FWHM) has been investigated numerically. For this purpose, a two-temperature model was used accounting for the optical and thermodynamical properties of molybdenum deposited on a selection of substrates. The effect of the substrate on laser-induced film heating has been studied for the cases of fused silica, silicon, soda-lime glass as well as for a free-standing film. For a fused silica substrate, the calculated melting threshold fluence is in a good agreement with thickness-dependent experimental data available in literature. It has been found that, for Mo films with the thickness 107 nm, the softening point of the fused silica substrate is exceeded already at the Mo melting threshold fluence. This suggests the possibility of substrate damage related to glass deformation.
Klasifikace
Druh
J<sub>imp</sub> - Článek v periodiku v databázi Web of Science
CEP obor
—
OECD FORD obor
10305 - Fluids and plasma physics (including surface physics)
Návaznosti výsledku
Projekt
<a href="/cs/project/EF15_003%2F0000445" target="_blank" >EF15_003/0000445: Pokročilá příprava funkčních materiálů: Od mono k bi- a tri-chromatické excitaci s použitím tvarovaných laserových pulsů</a><br>
Návaznosti
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Ostatní
Rok uplatnění
2022
Kód důvěrnosti údajů
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Údaje specifické pro druh výsledku
Název periodika
International Journal of Heat and Mass Transfer
ISSN
0017-9310
e-ISSN
1879-2189
Svazek periodika
196
Číslo periodika v rámci svazku
Nov
Stát vydavatele periodika
US - Spojené státy americké
Počet stran výsledku
10
Strana od-do
123292
Kód UT WoS článku
000883417500008
EID výsledku v databázi Scopus
2-s2.0-85135395907