Nanotribology of transition metal dichalcogenide flakes deposited by chemical vapour deposition: The influence of chemical composition and sliding speed on nanoscale friction of monolayers

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F21%3A00350657" target="_blank" >RIV/68407700:21230/21:00350657 - isvavai.cz</a>

Výsledek na webu

<a href="https://doi.org/10.1016/j.apsusc.2021.149762" target="_blank" >https://doi.org/10.1016/j.apsusc.2021.149762</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.apsusc.2021.149762" target="_blank" >10.1016/j.apsusc.2021.149762</a>

Jazyk výsledku

angličtina

Název v původním jazyce

Nanotribology of transition metal dichalcogenide flakes deposited by chemical vapour deposition: The influence of chemical composition and sliding speed on nanoscale friction of monolayers

Popis výsledku v původním jazyce

We present nanoscale frictional analysis of three commonly used transition metal dichalcogenide (TMD) monolayers, WS2, MoSe2 and WSe2, deposited by chemical vapour deposition (CVD). The monolayers were characterised by Raman spectroscopy, photoluminescence spectroscopy (PL), and X-ray spectroscopy (XPS), to determine the composition of the coating and confirm monolayer structure. Nanoscale frictional analysis was performed by atomic force microscopy (AFM). Load-dependent frictional behaviour was measured at different sliding speeds to quantitatively assess friction on each sample. All samples experienced low nanoscale friction, with the lowest friction observed on WSe2. The friction was independent of sliding speed within the analysed range. Furthermore, monolayer TMDs significantly increase the operational load range by at least one order of magnitude when compared to SiO2 substrate.

Název v anglickém jazyce

Nanotribology of transition metal dichalcogenide flakes deposited by chemical vapour deposition: The influence of chemical composition and sliding speed on nanoscale friction of monolayers

Popis výsledku anglicky

We present nanoscale frictional analysis of three commonly used transition metal dichalcogenide (TMD) monolayers, WS2, MoSe2 and WSe2, deposited by chemical vapour deposition (CVD). The monolayers were characterised by Raman spectroscopy, photoluminescence spectroscopy (PL), and X-ray spectroscopy (XPS), to determine the composition of the coating and confirm monolayer structure. Nanoscale frictional analysis was performed by atomic force microscopy (AFM). Load-dependent frictional behaviour was measured at different sliding speeds to quantitatively assess friction on each sample. All samples experienced low nanoscale friction, with the lowest friction observed on WSe2. The friction was independent of sliding speed within the analysed range. Furthermore, monolayer TMDs significantly increase the operational load range by at least one order of magnitude when compared to SiO2 substrate.

Druh

J_imp - Článek v periodiku v databázi Web of Science

CEP obor

—

OECD FORD obor

20501 - Materials engineering

Projekt

<a href="/cs/project/EF16_026%2F0008396" target="_blank" >EF16_026/0008396: Nové nanostruktury pro inženýrské aplikace umožněné kombinací moderních technologií a pokročilých simulací</a><br>

Návaznosti

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Rok uplatnění

2021

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Applied Surface Science

ISSN

0169-4332

e-ISSN

1873-5584

Svazek periodika

556

Číslo periodika v rámci svazku

August

Stát vydavatele periodika

NL - Nizozemsko

Počet stran výsledku

8

Strana od-do

1-8

Kód UT WoS článku

000651207300001

EID výsledku v databázi Scopus

2-s2.0-85104358820