The Alpha-Particle Excited Scintillation Response of YAG:Ce thin Films Grown by Liquid Phase Epitaxy

Kód výsledku v IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21340%2F09%3A00166864" target="_blank" >RIV/68407700:21340/09:00166864 - isvavai.cz</a>

Výsledek na webu

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DOI - Digital Object Identifier

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Jazyk výsledku

angličtina

Název v původním jazyce

The Alpha-Particle Excited Scintillation Response of YAG:Ce thin Films Grown by Liquid Phase Epitaxy

Popis výsledku v původním jazyce

Y3Al5O12 :Ce (YAG:Ce) thin films were grown from PbO-, BaO-, and MoO3-based fluxes using the liquid phase epitaxy (LPE) method. Photoelectron yield, its time dependence within 0.5-10 microseconds shaping time, and energy resolution of these samples weremeasured under alpha-particle excitation. For comparison a sample of the Czochralski grown bulk YAG: Ce single crystal was measured as well. Photoelectron yield values of samples grown from the BaO-based flux were found superior to other LPE films and comparable with that of the bulk single crystal. The same is valid also for the time dependence of photoelectron yield. Obtained results are discussed taking into account the influence of the flux and technology used. Additionally, alpha particle energy deposition in very thin films is modelled and discussed.

Název v anglickém jazyce

The Alpha-Particle Excited Scintillation Response of YAG:Ce thin Films Grown by Liquid Phase Epitaxy

Popis výsledku anglicky

Y3Al5O12 :Ce (YAG:Ce) thin films were grown from PbO-, BaO-, and MoO3-based fluxes using the liquid phase epitaxy (LPE) method. Photoelectron yield, its time dependence within 0.5-10 microseconds shaping time, and energy resolution of these samples weremeasured under alpha-particle excitation. For comparison a sample of the Czochralski grown bulk YAG: Ce single crystal was measured as well. Photoelectron yield values of samples grown from the BaO-based flux were found superior to other LPE films and comparable with that of the bulk single crystal. The same is valid also for the time dependence of photoelectron yield. Obtained results are discussed taking into account the influence of the flux and technology used. Additionally, alpha particle energy deposition in very thin films is modelled and discussed.

Druh

J_x - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)

CEP obor

BG - Jaderná, atomová a molekulová fyzika, urychlovače

OECD FORD obor

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Projekt

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Návaznosti

Z - Vyzkumny zamer (s odkazem do CEZ)

Rok uplatnění

2009

Kód důvěrnosti údajů

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Název periodika

Physica Status Soliti a

ISSN

1862-6300

e-ISSN

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Svazek periodika

206

Číslo periodika v rámci svazku

A

Stát vydavatele periodika

GB - Spojené království Velké Británie a Severního Irska

Počet stran výsledku

7

Strana od-do

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Kód UT WoS článku

000268564200019

EID výsledku v databázi Scopus

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