Vše

Co hledáte?

Vše
Projekty
Výsledky výzkumu
Subjekty

Rychlé hledání

  • Projekty podpořené TA ČR
  • Významné projekty
  • Projekty s nejvyšší státní podporou
  • Aktuálně běžící projekty

Chytré vyhledávání

  • Takto najdu konkrétní +slovo
  • Takto z výsledků -slovo zcela vynechám
  • “Takto můžu najít celou frázi”

The effect of apparent cross-link density on Cut and Chip wear in natural rubber

Identifikátory výsledku

  • Kód výsledku v IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F70883521%3A28610%2F23%3A63574719" target="_blank" >RIV/70883521:28610/23:63574719 - isvavai.cz</a>

  • Výsledek na webu

  • DOI - Digital Object Identifier

Alternativní jazyky

  • Jazyk výsledku

    angličtina

  • Název v původním jazyce

    The effect of apparent cross-link density on Cut and Chip wear in natural rubber

  • Popis výsledku v původním jazyce

    Natural rubber (NR) is a polymer that at certain stress levels undergoes strain induced crystallization (SIC) which contributes to increased resistance to cut and chip (CC) wear when exposed to harsh conditions. This unique property of NR is dependent on several factors, including the processing conditions, the cross-linking system and the type of used additives. These factors subsequently result in variations of apparent cross-linking density (CLD) of the cross-linked CB filled rubber. Therefore, this study focuses on the systematic investigation of CC wear phenomena as a function of CLDs represented by conventional (CV), semi-efficient (SEV) and efficient (EV) cross-linking systems for variations of loading conditions. Rubber samples based on different cross-linking systems were prepared by varying the concentration of the accelerator N-tertiarybutyl-2-benzothiazole sulfenamide (TBBS) at a constant concentration of 2.5 phr sulphur as cross-linking agent. Study showed increased NR resistance to CC wear using the CV system, i.e. in the region of (136-241 µmol x cm-3), when exposed to higher loading conditions. Furthermore, a significant influence of SIC on CC resistance was confirmed in the range of CLD from 181 to 241 µmol x cm-3. The findings suggest a positive effect of conventional cross-linking system on the resistance to CC wear of natural rubber-based products as are tyres or conveyor belts exposed to harsh operation conditions.

  • Název v anglickém jazyce

    The effect of apparent cross-link density on Cut and Chip wear in natural rubber

  • Popis výsledku anglicky

    Natural rubber (NR) is a polymer that at certain stress levels undergoes strain induced crystallization (SIC) which contributes to increased resistance to cut and chip (CC) wear when exposed to harsh conditions. This unique property of NR is dependent on several factors, including the processing conditions, the cross-linking system and the type of used additives. These factors subsequently result in variations of apparent cross-linking density (CLD) of the cross-linked CB filled rubber. Therefore, this study focuses on the systematic investigation of CC wear phenomena as a function of CLDs represented by conventional (CV), semi-efficient (SEV) and efficient (EV) cross-linking systems for variations of loading conditions. Rubber samples based on different cross-linking systems were prepared by varying the concentration of the accelerator N-tertiarybutyl-2-benzothiazole sulfenamide (TBBS) at a constant concentration of 2.5 phr sulphur as cross-linking agent. Study showed increased NR resistance to CC wear using the CV system, i.e. in the region of (136-241 µmol x cm-3), when exposed to higher loading conditions. Furthermore, a significant influence of SIC on CC resistance was confirmed in the range of CLD from 181 to 241 µmol x cm-3. The findings suggest a positive effect of conventional cross-linking system on the resistance to CC wear of natural rubber-based products as are tyres or conveyor belts exposed to harsh operation conditions.

Klasifikace

  • Druh

    O - Ostatní výsledky

  • CEP obor

  • OECD FORD obor

    20501 - Materials engineering

Návaznosti výsledku

  • Projekt

  • Návaznosti

    V - Vyzkumna aktivita podporovana z jinych verejnych zdroju

Ostatní

  • Rok uplatnění

    2023

  • Kód důvěrnosti údajů

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů