6-axis interferometric coordinates measurement system for nanometrology

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00177016%3A_____%2F14%3A%230001042" target="_blank" >RIV/00177016:_____/14:#0001042 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1117/12.2054802" target="_blank" >http://dx.doi.org/10.1117/12.2054802</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1117/12.2054802" target="_blank" >10.1117/12.2054802</a>

Result language
angličtina
Original language name
6-axis interferometric coordinates measurement system for nanometrology
Original language description
We present an overview of approaches to the design of nanometrology coordinates measuring setup with a focus on methodology of nanometrology interferometric techniques and associated problems. The design and development of a nanopositioning system with interferometric multiaxis monitoring and control involved for scanning probe microscopy techniques (primarily atomic force microscopy, AFM) for detection of the sample profile is presented. Coordinate position sensing allows upgrading the imaging microscope techniques up to quantified measuring. Especially imaging techniques in the micro- and nanoworld overcoming the barrier of resolution given by the wavelength of visible light are a suitable basis for design of measuring systems with the best resolution possible. The practical measurement results of active compensation system for positioning angle errors suppression are presented as well as the analysis of overall achievable parameters. The system is being developed in cooperation with
Czech name
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Czech description
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Project
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Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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