XRD study of thickness dependence of crystallization and stresses in TiO2 thin films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F09%3A00207040" target="_blank" >RIV/00216208:11320/09:00207040 - isvavai.cz</a>
Result on the web
—
DOI - Digital Object Identifier
—
Alternative languages
Result language
angličtina
Original language name
XRD study of thickness dependence of crystallization and stresses in TiO2 thin films
Original language description
In this work a complex X-ray diffraction (XRD) study of thin TiO2 films on Si substrates with different thicknesses (50-2000 nm) prepared by magnetron sputtering is presented. Crystallisation process of amorphous films was studied in-situ. XRD reflectivity, texture and stress measurements were performed ex-situ. Other amorphous and nanocrystalline powders were also measured for comparison.
Czech name
—
Czech description
—
Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
—
Result continuities
Project
—
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2009
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Materials Structure in Chemistry. Biology. Physics and Technology
ISSN
1211-5894
e-ISSN
—
Volume of the periodical
16
Issue of the periodical within the volume
2a
Country of publishing house
CZ - CZECH REPUBLIC
Number of pages
2
Pages from-to
—
UT code for WoS article
—
EID of the result in the Scopus database
—