Time-Resolved Diagnostics of Dual High Power Impulse Magnetron Sputtering With Pulse Delays of 15 us and 500 us
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F11%3A10108240" target="_blank" >RIV/00216208:11320/11:10108240 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1002/ctpp.201000065" target="_blank" >http://dx.doi.org/10.1002/ctpp.201000065</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1002/ctpp.201000065" target="_blank" >10.1002/ctpp.201000065</a>
Alternative languages
Result language
angličtina
Original language name
Time-Resolved Diagnostics of Dual High Power Impulse Magnetron Sputtering With Pulse Delays of 15 us and 500 us
Original language description
Time-resolved measurements have been performed during dual High Power Impulse Magnetron Sputtering (dual-HiPIMS) with two cathodes in a closed magnetic field configuration. The effect of a delay between subsequent pulses on electron density, mean electron energy, and ion flux to the substrate was investigated by time-resolved diagnostic methods. Two different delays of 15 mu s and 500 mu s between subsequent pulses were investigated. The dual-HiPIMS system, operated at a repetition frequency f = 100 Hzand duty cycle of 1 %, was equipped with different metallic targets (Ti, Cu). It is shown that a delay between subsequent pulses influences the plasma parameters and can be used to control deposition processes. It was noted that target surfaces (alternately serving as a cathode/anode) are contaminated by sputtered material from the previous pulse which influences the time-evolution of the discharge parameters.
Czech name
—
Czech description
—
Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
—
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)<br>S - Specificky vyzkum na vysokych skolach
Others
Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Contributions to Plasma Physics
ISSN
0863-1042
e-ISSN
—
Volume of the periodical
51
Issue of the periodical within the volume
2
Country of publishing house
DE - GERMANY
Number of pages
9
Pages from-to
237-245
UT code for WoS article
000288610800020
EID of the result in the Scopus database
—