Time-resolved diagnostics of dual high power impulse magnetron sputtering with pulse delays of 15 ?s and 500 ?s

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F11%3A00359582" target="_blank" >RIV/68378271:_____/11:00359582 - isvavai.cz</a>

Result on the web

<a href="http://dx.doi.org/10.1002/ctpp.201000065" target="_blank" >http://dx.doi.org/10.1002/ctpp.201000065</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1002/ctpp.201000065" target="_blank" >10.1002/ctpp.201000065</a>

Result language

angličtina

Original language name

Time-resolved diagnostics of dual high power impulse magnetron sputtering with pulse delays of 15 ?s and 500 ?s

Original language description

Time-resolved measurements have been performed during dual High Power Impulse Magnetron Sputtering (dual-HiPIMS) with two cathodes in a closed magnetic field configuration. The effect of a delay between subsequent pulses on electron density, mean electron energy, and ion flux to the substrate was investigated by time-resolved diagnostic methods. Two different delays of 15 ?s and 500 ?s between subsequent pulses were investigated. The dual-HiPIMS system, operated at a repetition frequency f = 100 Hz andduty cycle of 1 %, was equipped with different metallic targets (Ti, Cu). It is shown that a delay between subsequent pulses influences the plasma parameters and can be used to control deposition processes. It was noted that target surfaces (alternatelyserving as a cathode/anode) are contaminated by sputtered material from the previous pulse which influences the time-evolution of the discharge parameters.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BH - Optics, masers and lasers

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2011

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Contributions to Plasma Physics

ISSN

0863-1042

e-ISSN

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Volume of the periodical

51

Issue of the periodical within the volume

2

Country of publishing house

DE - GERMANY

Number of pages

9

Pages from-to

237-245

UT code for WoS article

000288610800020

EID of the result in the Scopus database

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