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Oxidation behavior of Cu nanoparticles embedded into semiconductive TiO2 matrix

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216208%3A11320%2F15%3A10319610" target="_blank" >RIV/00216208:11320/15:10319610 - isvavai.cz</a>

  • Alternative codes found

    RIV/60076658:12310/15:43888689 RIV/68378271:_____/15:00510812

  • Result on the web

    <a href="http://dx.doi.org/10.1016/j.tsf.2015.07.026" target="_blank" >http://dx.doi.org/10.1016/j.tsf.2015.07.026</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1016/j.tsf.2015.07.026" target="_blank" >10.1016/j.tsf.2015.07.026</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Oxidation behavior of Cu nanoparticles embedded into semiconductive TiO2 matrix

  • Original language description

    Metal nanoparticles embedded into a semiconductive matrix represent a promising material for widely sought advanced technological applications. We focused our interest on the preparation of TiO2 matrix with embedded Cu nanoparticles. In particular, we studied the effect of reactive discharge (Ar/O-2) exposition on copper oxidation, which can result in two stable forms: cuprous oxide (Cu2O) and cupric oxide (CuO). Copper nanoparticles, of size in range 10-50 nm, were produced by magnetron sputtering in combination with gas aggregation. The beam of Cu nanoparticles was impinging onto a silicon substrate which was directly exposed to a reactive Ar/O-2 magnetron discharge providing sputtering of Ti target at the same time. The properties of deposited nanocomposite Cu(O-x)-TiO2 were investigated by X-ray photoelectron spectroscopy, grazing incidence X-ray diffractometry, X-ray reflectometry and scanning electron microscopy techniques to reveal the nanocomposite properties and to understand

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/GAP108%2F12%2F2104" target="_blank" >GAP108/12/2104: Advanced semiconductor materials for photoelectrochemical water splitting</a><br>

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2015

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Thin Solid Films

  • ISSN

    0040-6090

  • e-ISSN

  • Volume of the periodical

    589

  • Issue of the periodical within the volume

    Aug

  • Country of publishing house

    NL - THE KINGDOM OF THE NETHERLANDS

  • Number of pages

    8

  • Pages from-to

    864-871

  • UT code for WoS article

    000360320000136

  • EID of the result in the Scopus database

    2-s2.0-84940062502