Deposition of polymer films by rf discharge at atmospheric pressure

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F04%3A00019762" target="_blank" >RIV/00216224:14310/04:00019762 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Deposition of polymer films by rf discharge at atmospheric pressure
Original language description
RF plasma nozzle at atmospheric pressure has been used for deposition of thin films. The mechanical properties of deposited films were studied using indentation technique. Special properties of RF discharges offer hopeful technological applications likedeposition of thin solid films. The parameters of the plasma were investigated by spectral and optical methods. The powered RF electrode of the torch discharge plasma source is made from the metal or dielectric pipe with an inner diameter of 1 - 2 mm andwith a length of several centimeters. The electrode is connected through the matching unit to the RF generator driven at the frequency of 13.56 MHz. The mixture of argon and n-hexane or HMDSO (hexamethyldisiloxane, C6H18Si2O) gas ows through the RF electrode at the pipe. Polymer films were deposited on the several substrates e.g. glass, brass polished plates and Si wafers.
Czech name
Depozice polymerních vrstev v rf výboji za atmosférického tlaku
Czech description
Depozice polymerních vrstev v rf výboji za atmosférického tlaku

Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2004
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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