Precise measurement of thickness distribution of non-uniform thin films by imaging spectroscopic reflectometry

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F09%3A00030121" target="_blank" >RIV/00216224:14310/09:00030121 - isvavai.cz</a>
Alternative codes found
RIV/48399108:_____/09:#0000013 RIV/00216305:26210/09:PU83316
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Precise measurement of thickness distribution of non-uniform thin films by imaging spectroscopic reflectometry
Original language description
A new method of imaging spectroscopic photometry enabling us to perform the complete optical characterization of thin films exhibiting area non-uniformity in optical parameters is presented. An original imaging spectroscopic photometer operating in the reflection mode at normal incidence is used to apply this method. A CCD camera serves as a detector in this photometer. Therefore the spectral dependences of the reflectance of the films characterized are simultaneously measured in small areas of the films surface corresponding to the individual pixels of the CCD camera. These areas form a matrix along a relatively large part of the films surface. The spectral reflectance measured by the individual pixels of the CCD camera is treated separately using theformulae for the reflectance corresponding to the uniform thin films. Using these formulae it is possible to determine the values of the local thickness and local optical constants for every small area of the matrix.
Czech name
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Czech description
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2009
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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