Study of hybrid PVD-PECVD process and its application for metal/carbon film deposition

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F12%3A00057674" target="_blank" >RIV/00216224:14310/12:00057674 - isvavai.cz</a>
Result on the web
—
DOI - Digital Object Identifier
—

Result language
angličtina
Original language name
Study of hybrid PVD-PECVD process and its application for metal/carbon film deposition
Original language description
Hybrid PVD-PECVD process of titanium sputtering in mixture of argon and acetylene combines aspects of both conventional techniques: sputtering of titanium target (PVD) and deposition from acetylene which acts as a source of carbon for polymerization (PECVD). This contribution reports and corelates both the properties of the deposited coating and the deposition process characteristics. nc-TiC/a-C:H coating with hardness and Young?s modulus over 40 GPa and 400 GPa respectively with adhesion in range HF0-HF1 on Ti coated HSS and WC were prepared. Hysteresis free and non-monotonous evolution of discharge voltage determines three characteristic zones of the process evolution with the acetylene supply. The evolution of discharge voltage was correlated with the evolution of the state of the target and OES. At zone I, for low acetylene supply, the discharge voltage and H line intensity increase and the initially pure Ti racetrack is getting covered by TiC.
Czech name
—
Czech description
—

Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Similar results(10)