Influence of deposition conditions on electrical and mechanical properties of Sm2O3 doped CeO2 thin films prepared by EB-PVD (+IBAD) methods part 2. Indentation hardness and effective elastic modulus

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F13%3A00070881" target="_blank" >RIV/00216224:14310/13:00070881 - isvavai.cz</a>

Result on the web

<a href="http://dx.doi.org/10.1134/S1023193513070033" target="_blank" >http://dx.doi.org/10.1134/S1023193513070033</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1134/S1023193513070033" target="_blank" >10.1134/S1023193513070033</a>

Result language

angličtina

Original language name

Influence of deposition conditions on electrical and mechanical properties of Sm2O3 doped CeO2 thin films prepared by EB-PVD (+IBAD) methods part 2. Indentation hardness and effective elastic modulus

Original language description

The study of polycrystalline CeO2 + xSm2O3 (x = 0, 10.9?15.9 mol %) thin films deposited by Electron Beam Physical Vapour Deposition (EBPVD) and Ionic Beam Assisted Deposition (IBAD) techniques on the Si substrate was devoted to the influence of deposition conditions used, namely composition x, deposition temperature Tdep and Ar+ ion bombardment, on the (micro)hardness, Hpl and elastic modulus,Y with respect to the film structure and microstructure. These mechanical characteristics were investigated bythe instrumented indentation technique as the functions of relative indentation depth hrel = hmax/t and the values obtained were compared with those obtained by the classical Vickers technique. Results of this study are described and discussed.

Czech name

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Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

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OECD FORD branch

10305 - Fluids and plasma physics (including surface physics)

Project

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Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2013

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Russian Journal of Electrochemistry

ISSN

1023-1935

e-ISSN

—

Volume of the periodical

49

Issue of the periodical within the volume

7

Country of publishing house

RU - RUSSIAN FEDERATION

Number of pages

9

Pages from-to

619-627

UT code for WoS article

000321773800003

EID of the result in the Scopus database

2-s2.0-84880256641