Dynamics of bipolar HiPIMS discharges by plasma potential probe measurements
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F22%3A00119622" target="_blank" >RIV/00216224:14310/22:00119622 - isvavai.cz</a>
Result on the web
<a href="https://doi.org/10.1088/1361-6595/ac4b65" target="_blank" >https://doi.org/10.1088/1361-6595/ac4b65</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1088/1361-6595/ac4b65" target="_blank" >10.1088/1361-6595/ac4b65</a>
Alternative languages
Result language
angličtina
Original language name
Dynamics of bipolar HiPIMS discharges by plasma potential probe measurements
Original language description
The plasma potential at a typical substrate position is studied during the positive pulse of a bipolar high-power impulse magnetron sputtering (bipolar HiPIMS) discharge with a Cu target. The goal of the study is to identify suitable conditions for achieving ion acceleration independent on substrate grounding. We find that the time-evolution of the plasma potential during the positive pulse can be separated into several distinct phases, which are highly dependent on the discharge conditions. This includes exploring the influence of the working gas pressure (0.3 – 2 Pa), HiPIMS peak current (10 – 70 A corresponding to 0.5 – 3.5 A/cm2), HiPIMS pulse length (5 – 60 μs) and the amplitude of the positive voltage U+ applied during the positive pulse (0 – 150 V). At low enough pressure, high enough HiPIMS peak current and long enough HiPIMS pulse length, the plasma potential at a typical substrate position is seen to be close to 0 V for a certain time interval (denoted phase B) during the positive pulse. At the same time, spatial mapping of the plasma potential inside the magnetic trap region revealed an elevated value of the plasma potential during phase B. These two plasma potential characteristics are identified as suitable for achieving ion acceleration in the target region. Moreover, by investigating the target current and ion saturation current at the chamber walls, we describe a simple theory linking the value of the plasma potential profile to the ratio of the available target electron current and ion saturation current at the wall.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2022
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Plasma Sources Science and Technology
ISSN
0963-0252
e-ISSN
1361-6595
Volume of the periodical
31
Issue of the periodical within the volume
2
Country of publishing house
GB - UNITED KINGDOM
Number of pages
19
Pages from-to
1-19
UT code for WoS article
000757007300001
EID of the result in the Scopus database
2-s2.0-85125693639