On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14310%2F24%3A00136403" target="_blank" >RIV/00216224:14310/24:00136403 - isvavai.cz</a>
Result on the web
<a href="https://www.sciencedirect.com/science/article/pii/S0257897224006595" target="_blank" >https://www.sciencedirect.com/science/article/pii/S0257897224006595</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.surfcoat.2024.131028" target="_blank" >10.1016/j.surfcoat.2024.131028</a>
Alternative languages
Result language
angličtina
Original language name
On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species
Original language description
In the industry, there is a preference for robust and technologically straightforward solutions that can deliver desired products at reasonable costs. This study introduces a reliable, robust, and cost-effective ion-assisted thin film growth technique called moving focused magnetic field magnetron sputtering. At the core of this technology lies the generation of dense plasma within a small area of the target and the controlled movement of this plasma across the entire target surface. The deposition process, powered by a direct current generator, behaves similarly to high-power impulse magnetron sputtering and yields coatings with properties comparable to those produced by this method. Notably, this study marks the first application of an ion meter to measure the ionized metal flux fraction of sputtered titanium at industrial conditions, revealing values of up to 34% measured at the substrate position.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10300 - Physical sciences
Result continuities
Project
<a href="/en/project/LM2023039" target="_blank" >LM2023039: R&D centre for plasma and nanotechnology surface modifications</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2024
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Surface and Coatings Technology
ISSN
0257-8972
e-ISSN
1879-3347
Volume of the periodical
487
Issue of the periodical within the volume
July 2024
Country of publishing house
CH - SWITZERLAND
Number of pages
7
Pages from-to
1-7
UT code for WoS article
001260010200001
EID of the result in the Scopus database
2-s2.0-85196742483