Dependence of the Normalized Absorbance of the DLC:SiOx Thin Films on the Flow Rate of HMDSO

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14330%2F03%3A00009229" target="_blank" >RIV/00216224:14330/03:00009229 - isvavai.cz</a>
Alternative codes found
RIV/00216224:14330/03:00008608
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Dependence of the Normalized Absorbance of the DLC:SiOx Thin Films on the Flow Rate of HMDSO
Original language description
Hard diamond like carbon (DLC) films with an addition of SiOx were deposited by capacitively coupled rf discharges from mixture of methane and hexamethyldisiloxane (HMDSO). The flow rate was changed in order to vary the SiOx content in the films. Thickness of the films was determined by ellipsometry. FTIR spectra showed presence of C-H bonds as well as silicon bonded to hydrogen and hydrocarbon groups. In the region 630-900 cm-1 normalized absorbance was computed. It is shown that the concentration of silicon containing bonds grows with the flow rate of HMDSO growing.
Czech name
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Czech description
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Project
<a href="/en/project/GA202%2F00%2FP037" target="_blank" >GA202/00/P037: Plasma deposition of protective coatings: characterisation of prepared films and diagnostics of reactive plasmas used</a><br>
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2003
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
JUNIORMAT 03
ISBN
80-214-2462-1
ISSN
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e-ISSN
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Number of pages
2
Pages from-to
58
Publisher name
ÚMI VUT FSI v Brně ve spolupráci s Českou společností pro nové materiály a technologie
Place of publication
Brno
Event location
23.-24. 9. 2003, Brno
Event date
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Type of event by nationality
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UT code for WoS article
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