Lattice bending in three-dimensional Ge microcrystals studied by X-ray nanodiffraction and modelling
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216224%3A14740%2F16%3A00089936" target="_blank" >RIV/00216224:14740/16:00089936 - isvavai.cz</a>
Result on the web
<a href="http://journals.iucr.org/j/issues/2016/03/00/rg5104/index.html" target="_blank" >http://journals.iucr.org/j/issues/2016/03/00/rg5104/index.html</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1107/S1600576716006397" target="_blank" >10.1107/S1600576716006397</a>
Alternative languages
Result language
angličtina
Original language name
Lattice bending in three-dimensional Ge microcrystals studied by X-ray nanodiffraction and modelling
Original language description
Extending the functionality of ubiquitous Si-based microelectronic devices often requires combining materials with different lattice parameters and thermal expansion coefficients. In this paper, scanning X-ray nanodiffraction is used to map the lattice bending produced by thermal strain relaxation in heteroepitaxial Ge microcrystals of various heights grown on high aspect ratio Si pillars. The local crystal lattice tilt and curvature are obtained from experimental three-dimensional reciprocal space maps and compared with diffraction patterns simulated by means of the finite element method. The simulations are in good agreement with the experimental data for various positions of the focused X-ray beam inside a Ge microcrystal. Both experiment and simulations reveal that the crystal lattice bending induced by thermal strain relaxation vanishes with increasing Ge crystal height.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Applied Crystallography
ISSN
1600-5767
e-ISSN
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Volume of the periodical
49
Issue of the periodical within the volume
June
Country of publishing house
GB - UNITED KINGDOM
Number of pages
11
Pages from-to
976-986
UT code for WoS article
000377020600028
EID of the result in the Scopus database
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