Chalcogenide glass resists for lithography
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216275%3A25310%2F14%3A39897425" target="_blank" >RIV/00216275:25310/14:39897425 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Chalcogenide glass resists for lithography
Original language description
This chapter comprehensively reviews the possible structural and compositional changes of chalcogenide glasses induced by exposure with suitable radiation (VIS, UV, X-ray, e-beam, ions) which result in their highly selective wet or dry etching and make chalcogenide glasses superior resists for high resolution, gray scale lithography. Their photo- and e-beam resist applications are compared with those for widely used polymer resists.
Czech name
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Czech description
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Classification
Type
C - Chapter in a specialist book
CEP classification
JA - Electronics and optoelectronics
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GAP204%2F11%2F0832" target="_blank" >GAP204/11/0832: Fabrication of optical elements based on micro- and nanostructuring of chalcogenide layers</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Book/collection name
Chalcogenide Glasses: Preparation, Properties and Applications
ISBN
978-0-85709-345-5
Number of pages of the result
34
Pages from-to
562-596
Number of pages of the book
716
Publisher name
Woodhead Publishing
Place of publication
Cambridge
UT code for WoS chapter
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