Application of AFM in Microscopy and in Fabrication of Micro/Nanostructures

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26210%2F01%3APU22527" target="_blank" >RIV/00216305:26210/01:PU22527 - isvavai.cz</a>
Result on the web
—
DOI - Digital Object Identifier
—

Result language
angličtina
Original language name
Application of AFM in Microscopy and in Fabrication of Micro/Nanostructures
Original language description
In the paper AFM studies of microstructures etched by ion beams into Si and Au surfaces, and AFM local anodic oxidation of Ti thin films is presented. Using the AFM technique the etching limits of inert atoms in production of silicon and silver grids were found. It was proved that the height of Ti oxide lines fabricated by AFM increases linearly with the voltage between a tip and a sample. On the other hand, the half-width of the lines did not depend linearly on this voltage. The results are useful forrstudies of quantum effects in nanostructures and experiments in fabrication of nanoelectronic devices (e.g. SET).
Czech name
—
Czech description
—

Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2001
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
9th European Conference on Applications of Surface and Interface Analysis (ECASIA'01) Book of Abstracts
ISBN
—
ISSN
—
e-ISSN
—
Number of pages
1
Pages from-to
320-320
Publisher name
P. Marcus, A. Galtayries, N. Frémy
Place of publication
Avignon, France
Event location
Avignon
Event date
Sep 30, 2001
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
—

Similar results(10)