Application of AFM in microscopy and fabrication of micro/nanostructures.

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F02%3A12020098" target="_blank" >RIV/68081731:_____/02:12020098 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Application of AFM in microscopy and fabrication of micro/nanostructures.

Original language description

Atomic force microscopy (AFM) studies of microstructures made by ion beams on Si and Au surfaces and by AFM local anodic oxidation on Ti thin filmsis presented in the paper. By using the AFM technique, etching limits of inert atoms in the production of silicon and silver grids were found. It was proved thet the height of Ti oxide lines fabricated by AFM increases linearly with the voltage between a tip and a sample. On the other hand, thehalf-width of the lines did not depend linearly on this voltage. The results are useful for experiments in the fabrication of nanoelectronic devices (e.g. single-electron transistors).

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

JA - Electronics and optoelectronics

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2002

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Surface and interface analysis

ISSN

0142-2421

e-ISSN

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Volume of the periodical

34

Issue of the periodical within the volume

1

Country of publishing house

GB - UNITED KINGDOM

Number of pages

4

Pages from-to

352-355

UT code for WoS article

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EID of the result in the Scopus database

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