Analysis of thin films by TOF-LEIS

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26210%2F07%3APU67845" target="_blank" >RIV/00216305:26210/07:PU67845 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Analysis of thin films by TOF-LEIS

Original language description

In the paper the design and application of a TOF-LEIS instrument built into an UHV complex deposition and analytical apparatus is described. A special attention is aimed at demonstrating the ability of TOF-LEIS to analyse near-to-surface layers of thin films prepared both ex-situ and in-situ. Additionally, the monitoring of diffusion processes close to a sample surface by this technique is presented. It is shown that the broadening of peaks in TOF-LEIS spectra can be attributed to multiple scattering and inelastic losses of ions in deeper layers. As a result of that, the peak width of ultrathin films depends on their thickness.

Czech name

Analýza tenkých vrstev pomocí ToF-LEIS

Czech description

Analýza tenkých vrstev pomocí ToF-LEIS

Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2007

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Acta Physica Polonica A

ISSN

0587-4284

e-ISSN

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Volume of the periodical

111

Issue of the periodical within the volume

3

Country of publishing house

PL - POLAND

Number of pages

7

Pages from-to

335-341

UT code for WoS article

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EID of the result in the Scopus database

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