Optical Characterization of Non-Stoichiometric Silicon Nitride Films Exhibiting Combined Defects

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26210%2F19%3APU132605" target="_blank" >RIV/00216305:26210/19:PU132605 - isvavai.cz</a>

Alternative codes found

RIV/00216224:14310/19:00110403

Result on the web

<a href="https://www.mdpi.com/2079-6412/9/7/416" target="_blank" >https://www.mdpi.com/2079-6412/9/7/416</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.3390/coatings9070416" target="_blank" >10.3390/coatings9070416</a>

Result language

angličtina

Original language name

Optical Characterization of Non-Stoichiometric Silicon Nitride Films Exhibiting Combined Defects

Original language description

The study was devoted to optical characterization of non-stoichiometric silicon nitride films prepared by reactive magnetron sputtering in argon-nitrogen atmosphere onto cold (unheated) substrates. It was found that these films exhibit the combination of three defects: optical inhomogeneity (refractive index profile across the films), uniaxial anisotropy with the optical axis perpendicular to the boundaries and random roughness of the upper boundaries. The influence of the uniaxial anisotropy was included into the corresponding formulae of the optical quantities using the matrix formalism and the approximation of the inhomogeneous layer by a multilayer system consisting of large number thin homogeneous layers. The random roughness was described using the scalar diffraction theory. The processing of the experimental data was performed using the multi-sample modification of the least-squares method, in which experimental data of several samples differing in thickness were processed simultaneously. The dielectric response of the silicon nitride films was modeled using the modification of the universal dispersion model, which takes into account absorption processes corresponding to valence-to-conduction band electron transitions, excitonic effects and Urbach tail. The spectroscopic reflectometric and ellipsometric measurements were supplemented by measuring the uniformity of the samples using imaging spectroscopic reflectometry of the samples using imaging spectroscopic reflectometry.

Czech name

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Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

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OECD FORD branch

10306 - Optics (including laser optics and quantum optics)

Project

<a href="/en/project/LO1411" target="_blank" >LO1411: Development of Centre for low-cost plasma and nanotechnology surface modification</a><br>

Continuities

S - Specificky vyzkum na vysokych skolach

Publication year

2019

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Coatings, MDPI

ISSN

2079-6412

e-ISSN

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Volume of the periodical

˙9

Issue of the periodical within the volume

7

Country of publishing house

CH - SWITZERLAND

Number of pages

21

Pages from-to

1-21

UT code for WoS article

000478656200044

EID of the result in the Scopus database

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