TCAD tools in process and device simulation
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F02%3APU30455" target="_blank" >RIV/00216305:26220/02:PU30455 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
TCAD tools in process and device simulation
Original language description
The enormous power of today`s computers has enabled the TCAD (Technology CAD) to become a workhorse of microelectronics progress. The development of sophisticated and efficient one-, two- and three-dimensional semiconductor process and device software tools will provide the engineers significant leverage in conducting research into new areas of IC technologies. The contribution reviews process and device simulation tools in common use and deals with the required features of the new TCAD tools generaation.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
JA - Electronics and optoelectronics
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2002
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Electronics Devices and Systems EDS02. Proceedings.
ISBN
80-214-2180-0
ISSN
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e-ISSN
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Number of pages
6
Pages from-to
187-192
Publisher name
Ing. Z. Novotny, Brno 2002
Place of publication
Brno
Event location
Brno
Event date
Sep 9, 2002
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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