Early Access Tools - Integration of TCAD Tools and Fabrication

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F03%3APU39341" target="_blank" >RIV/00216305:26220/03:PU39341 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Early Access Tools - Integration of TCAD Tools and Fabrication
Original language description
To develop a powerful TCAD( Technology CAD ) package the two main problems are to be solved. The first one is to extract device model parameter values from front-end technological parameters. The second problem to be solved is to calibrate TCAD softwareto specific tools and process modules to give a fast, accurate and reliable method of evaluating and optimizing process conditions without the need to run numerous test wafers. At present the exploitation of the TCAD tools to solve these problems is undder study, and it seems to be just the beginning of a path that provides a new realm of highly accurate device performance modeling. The approaches to integrate process, device and circuit simulation TCAD tools are reviewed and examples to solve these problems by leading TCAD vendors are presented.
Czech name
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Czech description
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Project
<a href="/en/project/GA102%2F03%2F0720" target="_blank" >GA102/03/0720: Model parameters extraction for semiconductor structures</a><br>
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2003
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Electronic Devices and Systems 2003 - Proceedings
ISBN
80-214-2452-4
ISSN
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e-ISSN
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Number of pages
6
Pages from-to
270-275
Publisher name
Novotný-Brno
Place of publication
Brno
Event location
Brno
Event date
Sep 9, 2003
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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