Thick film resistor characterisation by non-linearity and resistance change after high voltage stress

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F04%3APU45408" target="_blank" >RIV/00216305:26220/04:PU45408 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Thick film resistor characterisation by non-linearity and resistance change after high voltage stress

Original language description

Experimental investigation on cermet thick film resistors shows, that non-linearity and resistance is changed after high voltage stressing. Stressing method is based on the short current pulse from capacitor discharge. In the thick film resistor the current is flying through conductive chains composed of conducting grains and filaments separated by thin insulating layer. It is supposed, that multi-spot contact is created between contact and resistive layer. Non-linearity and resistance were measured beffore and after high voltage stress. Three mechanisms were observed. (i) Sample resistance and non-linearity decreases after high voltage stressing. We suppose, that the effect of resistance and non-linearity lowering is caused by filaments fritting. During this process thin isolating film between metallic grains is either doped or shorted. (ii) Sample resistance and non-linearity increases after high voltage stressing. We suppose that in this case some conducting chains are destroyed bec

Czech name

Vyhodnocení kvality tlustovrstvových odporů pomocí měření změny nelinearity a odporu po namáhání vysokonapěťovým pulsem

Czech description

Experimental investigation on cermet thick film resistors shows, that non-linearity and resistance is changed after high voltage stressing. Stressing method is based on the short current pulse from capacitor discharge. In the thick film resistor the current is flying through conductive chains composed of conducting grains and filaments separated by thin insulating layer. It is supposed, that multi-spot contact is created between contact and resistive layer. Non-linearity and resistance were measured beffore and after high voltage stress. Three mechanisms were observed. (i) Sample resistance and non-linearity decreases after high voltage stressing. We suppose, that the effect of resistance and non-linearity lowering is caused by filaments fritting. During this process thin isolating film between metallic grains is either doped or shorted. (ii) Sample resistance and non-linearity increases after high voltage stressing. We suppose that in this case some conducting chains are destroyed bec

Type

D - Article in proceedings

CEP classification

JA - Electronics and optoelectronics

OECD FORD branch

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Project

<a href="/en/project/ME%20605" target="_blank" >ME 605: Noise of HEMT for global communication</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2004

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection

New Trends in Physics - Proceedings of the Conference

ISBN

80-7355-024-5

ISSN

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e-ISSN

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Number of pages

4

Pages from-to

88-91

Publisher name

Department of Physics FEEC, Brno University of Technology

Place of publication

Brno

Event location

Brno

Event date

Nov 11, 2004

Type of event by nationality

EUR - Evropská akce

UT code for WoS article

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