Non-lineartiy changes induced by current stress in thick film resistors
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F04%3APU45416" target="_blank" >RIV/00216305:26220/04:PU45416 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Non-lineartiy changes induced by current stress in thick film resistors
Original language description
Non-linearity measurements are widely used for quality and reliability testing of passive components. The main non-linearity sources in the ruthenium based thick film resistors are the transitions between conducting grains in the resistive paste volume,and the defects and cracks in the resistive layer and resistor/contact interface. The third harmonic voltage measurements are offered to investigate the effect of the degradation mechanism in thick film resistors after high current pulses. We applied to the resistors three short current pulses (t = 5 ms) with current density Jmax reaching 100times value of nominal current density JNom. This is sufficient to screen unstable devices. Third harmonic voltage (THV) and resistance were measured before and after the pulse stressing. We have found good correlation between relative change of THV and relative change of resistance, however THV measurements are about 5 times more sensitive. THV change after pulse stressing is proportional to the num
Czech name
Změna nelinearity způsobená proudovým namáháním v tlustovrstvových odporech
Czech description
Non-linearity measurements are widely used for quality and reliability testing of passive components. The main non-linearity sources in the ruthenium based thick film resistors are the transitions between conducting grains in the resistive paste volume,and the defects and cracks in the resistive layer and resistor/contact interface. The third harmonic voltage measurements are offered to investigate the effect of the degradation mechanism in thick film resistors after high current pulses. We applied to the resistors three short current pulses (t = 5 ms) with current density Jmax reaching 100times value of nominal current density JNom. This is sufficient to screen unstable devices. Third harmonic voltage (THV) and resistance were measured before and after the pulse stressing. We have found good correlation between relative change of THV and relative change of resistance, however THV measurements are about 5 times more sensitive. THV change after pulse stressing is proportional to the num
Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
JA - Electronics and optoelectronics
OECD FORD branch
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Result continuities
Project
<a href="/en/project/ME%20605" target="_blank" >ME 605: Noise of HEMT for global communication</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2004
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Capacitor and Resistor Technology
ISSN
0887-7491
e-ISSN
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Volume of the periodical
2004
Issue of the periodical within the volume
24
Country of publishing house
US - UNITED STATES
Number of pages
5
Pages from-to
154-158
UT code for WoS article
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EID of the result in the Scopus database
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