The Contribution of Contact in Non-linearity of CV Characteristic of Thick Film Resistor
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F11%3A00183831" target="_blank" >RIV/68407700:21230/11:00183831 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
The Contribution of Contact in Non-linearity of CV Characteristic of Thick Film Resistor
Original language description
The work deals with thick film resistors and their properties. The structures of resistive and conductive thick film layers were prepared by screen-printing by polymer thick film pastes. Samples were exposed to accelerated ageing in environment with enhanced temperature and humidity. Tested sample consist of thick film resistors with different width and length. The non-linearity of current-voltage characteristic of resistors was measured. The measured resistor include not only resistive layer but also interface between conductive and resistive layers. The influence such interface is analyzed.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
JA - Electronics and optoelectronics
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
34th International Spring Seminar on Electronics Technology
ISBN
978-1-4577-2111-3
ISSN
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e-ISSN
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Number of pages
4
Pages from-to
327-330
Publisher name
Technical University of Košice
Place of publication
Košice
Event location
Tatranská Lomnica
Event date
May 11, 2011
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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