All

What are you looking for?

All
Projects
Results
Organizations

Quick search

  • Projects supported by TA ČR
  • Excellent projects
  • Projects with the highest public support
  • Current projects

Smart search

  • That is how I find a specific +word
  • That is how I leave the -word out of the results
  • “That is how I can find the whole phrase”

RTS Noise and quantum transitions in submicron MOSFETs

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F07%3APU70493" target="_blank" >RIV/00216305:26220/07:PU70493 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    RTS Noise and quantum transitions in submicron MOSFETs

  • Original language description

    We compare two models of charge carrier capture and emission in silicon MOSFET, which is a source of RTS noise. In the SiO2 gate insulating layer and its interface with Si channel there is a high number of oxygen vacancies, creating localised states andtraps. Electron exchange between channel and traps within several nanometers distance is given by tunnelling processes and leads to generation of 1/f noise. Two possible mechanisms of electron tunnelling are discussed and theoretical results are comparedto experimental dependence of capture and emission parameters as a function of gate and drain voltage (electric field intensity) and temperature.

  • Czech name

    RTS šum a kvantové přechody v submikronových součástkách MOSFET

  • Czech description

    We compare two models of charge carrier capture and emission in silicon MOSFET, which is a source of RTS noise. In the SiO2 gate insulating layer and its interface with Si channel there is a high number of oxygen vacancies, creating localised states andtraps. Electron exchange between channel and traps within several nanometers distance is given by tunnelling processes and leads to generation of 1/f noise. Two possible mechanisms of electron tunnelling are discussed and theoretical results are comparedto experimental dependence of capture and emission parameters as a function of gate and drain voltage (electric field intensity) and temperature.

Classification

  • Type

    D - Article in proceedings

  • CEP classification

    JA - Electronics and optoelectronics

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/GA102%2F05%2F2095" target="_blank" >GA102/05/2095: Noise sources in semiconductor materials and devices</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Others

  • Publication year

    2007

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    New Trends in Physics

  • ISBN

    978-80-7355-078-3

  • ISSN

  • e-ISSN

  • Number of pages

    4

  • Pages from-to

    138-141

  • Publisher name

    VUT

  • Place of publication

    Brno

  • Event location

    Brno

  • Event date

    Nov 15, 2007

  • Type of event by nationality

    EUR - Evropská akce

  • UT code for WoS article