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IMPROVED MODEL FOR MOSFET VA CHARACTERISTICS

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F09%3APU81999" target="_blank" >RIV/00216305:26220/09:PU81999 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    čeština

  • Original language name

    IMPROVED MODEL FOR MOSFET VA CHARACTERISTICS

  • Original language description

    Experiments were carried out for n-channel CMOS technology. Electron concentration in the channel decreases linearly from the source to the drain contact. Diffusion current component is independent on the x-coordinate and it is equal to the drift currentcomponent for the low electric field. Lateral component of the electric field intensity is inhomogeneous in the channel and it has a minimum value near the source contact and increases with the distance from the source to the drain. It reaches maximum value near the drain electrode.

  • Czech name

    IMPROVED MODEL FOR MOSFET VA CHARACTERISTICS

  • Czech description

    Experiments were carried out for n-channel CMOS technology. Electron concentration in the channel decreases linearly from the source to the drain contact. Diffusion current component is independent on the x-coordinate and it is equal to the drift currentcomponent for the low electric field. Lateral component of the electric field intensity is inhomogeneous in the channel and it has a minimum value near the source contact and increases with the distance from the source to the drain. It reaches maximum value near the drain electrode.

Classification

  • Type

    D - Article in proceedings

  • CEP classification

    JA - Electronics and optoelectronics

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    Z - Vyzkumny zamer (s odkazem do CEZ)

Others

  • Publication year

    2009

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    Electronic Devices and Systems EDS'09 IMAPS CS International Conference 2009

  • ISBN

    978-80-214-3933-7

  • ISSN

  • e-ISSN

  • Number of pages

    4

  • Pages from-to

  • Publisher name

    NOVPRESS s.r.o.

  • Place of publication

    Nám. Republiky 15 Brno

  • Event location

    Brno

  • Event date

    Sep 2, 2009

  • Type of event by nationality

    WRD - Celosvětová akce

  • UT code for WoS article