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THE SELECTIVE BORON DOPING FROM LIQUID SOURCE BBr3

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F11%3APU97605" target="_blank" >RIV/00216305:26220/11:PU97605 - isvavai.cz</a>

  • Alternative codes found

    RIV/49610040:_____/11:#0000013

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    THE SELECTIVE BORON DOPING FROM LIQUID SOURCE BBr3

  • Original language description

    The boron diffusion makes pn junction on n-type wafer or BSF (Back Surface Field) for p-type wafer, essential parts of any solar cell. This paper focuses on different options for boron diffusion processes from liquid source BBr3 for p-type diffusion on n-type wafers. There are three options to create selective structure of boron diffusion from liquid source BBr3: masking layers, pre-doping of source wafer or combination. The masking properties of various dielectric barriers were verified by four point probe sheet resistance mapping; also ECV technique was applied for evaluation of boron concentration profile. The first method is based on masking layer deposited on surface. This method is more complex, because the process has many steps (application ofa masking layer, laser structuring or etching paste printing, boron diffusion and finally removal of the masking layer). Two different masking layers (PECVD SiNX or thermal oxide) were tested for this process. Masking layers have differen

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

    JA - Electronics and optoelectronics

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    S - Specificky vyzkum na vysokych skolach

Others

  • Publication year

    2011

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    Proceedings of the International Conference held in Hamburg, Germany

  • ISBN

    3-936338-27-2

  • ISSN

  • e-ISSN

  • Number of pages

    4800

  • Pages from-to

    2031-2033

  • Publisher name

    WIP

  • Place of publication

    Hamburg

  • Event location

    Hamburg

  • Event date

    Sep 5, 2011

  • Type of event by nationality

    WRD - Celosvětová akce

  • UT code for WoS article