Morphology and structural investigation of aluminum nitride layers prepared by magnetron sputtering

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F13%3APU103517" target="_blank" >RIV/00216305:26220/13:PU103517 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Morphology and structural investigation of aluminum nitride layers prepared by magnetron sputtering
Original language description
Aluminum nitride thin films were obtained by magnetron sputtering of aluminum target. The films surface was studied by atomic force microscopy and scanning electron microscopy. Using of buffer nitridized layer on the substrate allowed the formation of perfect structure films. Lateral force atomic force microscopy was used to study the morphology heterogeneity. The dependence of films structure on the formation conditions has been defined. The objective of the study is to contribute to the improvement oftechnological process of dry etching and film deposition.
Czech name
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Czech description
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2013
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Proceedings of the 19th Conference Student EEICT 2013
ISBN
978-80-214-4695-3
ISSN
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e-ISSN
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Number of pages
5
Pages from-to
134-138
Publisher name
Litera, Tabor 43a, 61200 Brno
Place of publication
Brno University of Technology
Event location
Brno
Event date
Apr 25, 2013
Type of event by nationality
CST - Celostátní akce
UT code for WoS article
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